电子器件功率模块用铝基板草酸阳极氧化工艺参数优化  

Optimization of Process Parameters for Oxalic Acid Anodic Oxidation of Aluminum Substrates for Electronic Devices Power Module

作　　者：杜相如 付巍 DU Xiangru;FU Wei(Shanxi Engineering Vocational College,Taiyuan 030009,China;School of Electrical and Control Engineering,North University of China,Taiyuan 030000,China)

机构地区：[1]山西工程职业学院,山西太原030009 [2]中北大学电气与控制工程学院,山西太原030000

出　　处：《电镀与精饰》2022年第2期41-45,共5页Plating & Finishing

基　　金：国家级职业教育教师教学创新团队2020课题研究项目(YB2020010302)。

摘　　要：采用草酸阳极氧化工艺对电子器件功率模块用铝基板进行表面处理,并考察了电解液温度、电流密度和氧化时间对氧化膜的厚度及腐蚀失重的影响。结果表明:电流密度从1 A/dm^(2)增加到3 A/dm^(2),氧化时间从35 min延长到75 min,氧化膜厚度都呈先增加后降低的趋势并且伴随着腐蚀失重先降低后增加。采用单一变量法得到铝基板草酸阳极氧化的最佳工艺参数为:电解液温度25℃、电流密度2 A/dm^(2)、氧化时间55 min。在最佳工艺参数下生成的氧化膜完整且均匀,呈蜂窝状多孔结构,厚度达到18.2μm且腐蚀失重最低,为2.72 mg/cm^(2),能对铝基板起到良好的腐蚀防护作用。Aluminum substrate for electronic devices power module was treated by oxalic acid anodic oxidation,and the influences of electrolyte temperature,current density and oxidation time on the thickness and corrosion weight loss of the oxidation films were investigated.The results showed that as the electrolyte temperature increased from 15℃to 35℃,the current density increased from 1 A/dm^(2)to 3 A/dm^(2)and the oxidation time prolonged from 35 min to 75 min,the thickness of oxidation films increased at first and then decreased,and decreased first and then increased with corrosion weight loss.The optimal process parameters for oxalic acid anodic oxidation of aluminum substrates were obtained by single variable method as follows:electrolyte temperature 25℃,current density 2 A/dm^(2),oxidation time 55 min.And the oxidation film formed under the optimal process parameters was complete and uniform,with a honeycomb porous structure.The thickness of optimal oxidation film reached 18.2μm and the corrosion weight loss was the lowest of 2.72 mg/cm^(2),it could play a good role in the corrosion protection of aluminum substrates.

关 键 词：草酸阳极氧化 铝基板 电解液温度 电流密度 氧化时间 

分 类 号：TN41[电子电信—微电子学与固体电子学]