光纤基底TiNi形状记忆合金薄膜制备工艺  

Technique of TiNi-based shape memory alloy thin film coating on optical fibers

作　　者：党俊坡 江秀娟[1] 唐振华 Dang Jun-Po;Jiang Xiu-Juan;Tang Zhen-Hua(School of Electromechanical Engineering,Guangdong University of Technology,Guangzhou 510006,China;School of Physics and Optoelectronic Engineering,Guangdong University of Technology,Guangzhou 510006,China)

机构地区：[1]广东工业大学机电工程学院,广州510006 [2]广东工业大学物理与光电工程学院,广州510006

出　　处：《物理学报》2022年第3期72-81,共10页Acta Physica Sinica

基　　金：广东省自然科学基金(批准号:2019A1515011229,2018A030313315)资助的课题。

摘　　要：将TiNi基记忆合金薄膜与光纤相结合可制成智能化、集成化且成本经济的微机电系统和微传感器件.本文采用磁控溅射法在二氧化硅光纤基底上制备TiNi记忆合金薄膜,系统讨论了溅射工艺参数以及后续退火处理对薄膜质量的影响.采用自研制光纤镀膜掩膜装置在直径为125μm的光纤圆周表面上形成均匀薄膜.实验表明:在靶基距、背底真空度、Ar气流量和溅射时间一定的条件下,溅射功率存在最佳值;溅射压强较大时,薄膜沉积速率较低,但薄膜表面粗糙度较小.进行退火处理后,薄膜形成较良好的晶体结构,Ti_(49.09)Ni_(50.91)薄膜中马氏体B19′相和奥氏体B2相共存,但以B19′为主.根据本文研究结果,在玻璃光纤基底上制备高质量的TiNi基记忆合金薄膜是可实现的,本工作为下一步研制微机电系统和微型传感器做了基础准备.Intelligent,integrated and cost-effective micro-electro-mechanical system(MEMS)and micro sensors can be developed with TiNi-based memory alloy thin film and optical fibers.Such devices can work in harsh environment,like in deep sea,in space with flammable or explosive objects,or with strong electromagnetic interference;and examples of their possible applications include gas concentration detection in underground mines,dynamic detection of production parameters in oil or gas mining,etc.As TiNi-based memory alloy thin film possesses good biocompatibility,such devices can also be used in intracranial/endocardial pressure test,surgical resection,early cancer assessment,etc.The successful development of the above MEMS and micro sensors involve optical fibers coated with memory alloy films.However,unlike the common planar substrates,optical fiber is of a cylinder with a small diameter,and how to grow good-quality memory alloy film on its surface remains to be explored.In this work,the silica fibers are coated with TiNi memory alloy films by magnetron sputtering.How to choose the proper operating parameters in the sputtering process,and also the effects of subsequent annealing treatment on the films,are discussed in detail.Uniform thin films are grown on the 125-μm-diameter cylindrical surfaces of optical fibers with our built coating mask device specially designed for fibers.The experiments show that when target-substrate distance,background vacuum degree,Ar gas flow and sputtering time are fixed in the sputtering process,the sputtering power can be optimized,while a higher sputtering pressure results in lower film deposition rate but better surface roughness.The thin film is well crystallized under annealing,and the major martensite B19′phase and minor austenite B2 phase coexist in the Ti_(49.09)Ni_(50.91) film.In the experiments,with the optimal operating parameters(sputtering power of 150 W and sputtering pressure of 0.23 Pa),TiNi memory alloy film about 852.2 nm in thickness is grown on the fiber at a deposition

关 键 词：光纤 TiNi薄膜 磁控溅射 工艺参数 

分 类 号：TG139.6[一般工业技术—材料科学与工程] TB383.2[金属学及工艺—合金]