激光化学气相沉积法制备多层氧化铈缓冲层薄膜  

Preparation of Multilayer Cerium Oxide Buffer-Layer Films by Laser Chemical Vapor Deposition

作　　者：陈志杰 潘天宇 徐源来[3] 赵培 CHEN Zhijie;PAN Tianyu;XU Yuanlai;ZHAO Pei(School of Materials Science and Engineering,Wuhan Institute of Technology,Wuhan 430205,China;Hubei Key Laboratory of Plasma Chemical and Advanced Materials(Wuhan Institute of Technology),Wuhan 430205,China;Key Laboratory of Green Chemical Engineering Process(Wuhan Institute of Technology),Ministry of Education,Wuhan 430205,China)

机构地区：[1]武汉工程大学材料科学与工程学院,湖北武汉430205 [2]等离子体化学与新材料湖北省重点实验室(武汉工程大学),湖北武汉430205 [3]绿色化工过程教育部重点实验室(武汉工程大学),湖北武汉430205

出　　处：《武汉工程大学学报》2022年第1期42-47,共6页Journal of Wuhan Institute of Technology

基　　金：国家自然科学基金(51972241);武汉工程大学第十二届研究生教育创新基金(CX2020159)。

摘　　要：为了增强第二代高温超导薄膜的载流性能,通过激光化学气相沉积法在镀有LaMnO_(3)/MgO/Gd_(2)Zr_(2)O_(7)复合涂层的哈氏C276合金基板上制备了2、3、4、5和6层氧化铈缓冲层薄膜。研究了氧化铈薄膜层数对薄膜相组成、结晶度、薄膜微观形貌和晶粒尺寸的影响。实验结果表明,制备出了单相(100)氧化铈薄膜。随着薄膜层数的增加,其面内取向变好。薄膜结晶度在2层时最低,在5层时最高。随着氧化铈薄膜层数从2层增加到6层,氧化铈薄膜的平均晶粒尺寸从28.98 nm增加到86.10 nm。氧化铈晶粒形状从大部分正方金字塔形变为相互正交的矩形棱台形并且晶粒间出现10~50 nm的孔洞。通过引入激光加速前驱体分解,2层氧化铈薄膜的厚度达到136 nm,薄膜沉积速率高达2.45μm·h^(-1)。To improve electrical properties of the second-generation high-temperature superconducting film,buffer-layer CeO_(2) films with 2,3,4,5 and 6 layers were prepared on Hastelloy C276 substrate coated with LaMnO_(3)/MgO/Gd_(2)Zr_(2)O_(7) by laser chemical vapor deposition.Effects of the layers with different thickness on the phase composition,crystallite,microstructure and grain size of the film were investigated,respectively.The results show that CeO_(2) film with pure(100)preferred orientation is prepared.With increasing the layers'thickness,the in-plane orientation of the CeO_(2) film is improved.The crystallinity of the CeO_(2) films is minimum at 2 layers and maximum at 5 layers.With increasing the layers'number from 2 to 6,the average grain size of the CeO_(2) film increases from 28.98 to 86.10 nm;meanwhile,the shapes of the majority CeO_(2) grains change from pyramid to orthogonal rectangular prisms with a small number of holes about 10-50 nm scattered.By the introduction of laser,the decomposition rate of CeO_(2) precursor is improved effectively,as a result,the thickness of the 2-layed CeO_(2) film reaches 136 nm with the corresponding deposition rate of 2.45μm·h^(-1).

关 键 词：氧化铈缓冲层薄膜 激光化学气相沉积 晶粒尺寸 多层薄膜 

分 类 号：TB39[一般工业技术—材料科学与工程]