提高微米金刚石聚晶薄膜的场发射点密度研究  

Study on Increasing the Field Emission Point Density of Micron Diamond Polycrystalline Film

作　　者：高金海 崔颖琦[1] 张洁 李成刚 张兵临 GAO Jinhai;CUI Yingqi;ZHANG Jie;LI Chenggang;ZHANG Binglin(College of Physics and Electronic Engineering,Zhengzhou Normal University,Zhengzhou He’nan 450044,China;Key Laboratory of Material Physics,Ministry of Education,College of Physical Engineering,Zhengzhou University,Zhengzhou He’nan 450052,China)

机构地区：[1]郑州师范学院物理与电子工程学院,河南郑州450044 [2]郑州大学物理工程学院材料物理教育部重点实验室,河南郑州450052

出　　处：《电子器件》2021年第6期1381-1384,共4页Chinese Journal of Electron Devices

基　　金：教育部科学技术重点项目(205091);国家自然科学基金青年科学基金项目(11904326);河南省高等学校重点科研项目(16A140039);河南省科技厅科技攻关项目(182102210140);2017年度河南省科技计划项目(172102210115)。

摘　　要：利用微波等离子化学气相沉积的方法,制备出微米金刚石聚晶颗粒薄膜,通过扫描电镜、拉曼光谱、X射线实验,分析了薄膜的形貌与结构,用场发射二级结构研究薄膜的场发射性能。研究了微米金刚石聚晶薄膜的产生的机理,调整制备过程中的参数来增加聚晶颗粒的密度,提高场发射点的密度,为制备大面积、均匀的场发射阴极打下基础。Micron diamond polycrystalline particle films were prepared by microwave plasma chemical vapor deposi-tion.The morphology and structure of the films were analyzed by scanning electron microscopy,Raman spectroscopy and X-ray experiments.The field emission properties of the films were studied by means of emission secondary structure.The mechanism of producing micron diamond polycrystalline film was further analyzed,and the parameters in the preparation process were adjusted to increase the density of polycrystalline particles and improve the density of field emission points,so as to make a little contribution to the preparation of large area and uniform field emission cathode.

关 键 词：微波等离子体化学气相沉积 微米金刚石聚晶薄膜 场发射 

分 类 号：TB383[一般工业技术—材料科学与工程] O484[理学—固体物理]