基于边缘光抑制技术的双光束激光直写纳米光刻系统  

Dual-Beam Laser Direct Writing Nano-Lithography System Based on Peripheral Photoinhibition Technology

作　　者：周国尊 何敏菲 杨臻垚 曹春 谢飞 曹耀宇 匡翠方[1,2] 刘旭 Zhou Guozun;He Minfei;Yang Zhenyao;Cao Chun;Xie Fei;Cao Yaoyu;Kuang Cuifang;Liu Xu(State Key Laboratory of Modern Optical Instrumentation,College of Optical Science and Engineering,Zhejiang University,Hangzhou,Zhejiang 310027,China;Research Center for Smart Sensing,Zhejiang Laboratory,Hangzhou,Zhejiang 310023,China;Guangdong Provincial Key Laboratory of Optical Fiber Sensing and Communications,Institute of Photonics Technology,Jinan University,Guangzhou,Guangdong 510000,China)

机构地区：[1]浙江大学光电科学与工程学院现代光学仪器国家重点实验室,浙江杭州310027 [2]之江实验室超级感知研究中心,浙江杭州310023 [3]暨南大学光子技术研究院广东省光纤传感与通信技术重点实验室,广东广州510000

出　　处：《中国激光》2022年第2期1-11,共11页Chinese Journal of Lasers

基　　金：浙江省自然科学基金重大项目(LD21F050002);之江实验室重大科研项目(2020MC0AE01)。

摘　　要：利用边缘光抑制技术,设计并研制了一套双光束激光三维直写光刻系统。该系统含有高速扫描振镜和三维纳米压电平台两组扫描机构,可以根据不同加工需求完成多种扫描模式下的微纳结构制造。分析了光刻光束中激发光与抑制光的能量变化对加工精度的影响,通过对光刻光束能量的精确控制,实现了基板表面最小线宽为64 nm的均匀线条和线宽为30 nm的悬浮线的稳定加工,加工结构的线宽变化符合理论预期。该系统在进行实用器件加工时,最高加工产率可达到0.6 mm;/min。使用该系统加工制造了多种微纳结构,证实了其具备加工大深宽比周期结构、复杂曲线结构和不规则三维结构的能力。Objective Laser direct writing technology based on peripheral photoinhibition(PPI) is a three-dimensional direct writing lithography technology that utilizes nonlinear optical effects to reduce the lithographic linewidth. Compared with two-photon laser direct writing, the PPI technology can achieve high resolution and three-dimensional laser fabrication beyond the optical diffraction limit. However, there are still some limitations in the design and development of the PPI laser direct writing lithography system. At present, the PPI laser direct writing lithography system generally selects a high precision piezoelectric platform as a single scanning device, because the piezoelectric platform has the advantages of high stability, direct three-dimensional scanning, and simplified optical design. However, the scanning speed of the piezoelectric platform is unacceptable in nanofabrication, and the large inertia of the piezoelectric platform makes the acceleration and deceleration time too long in the scanning process. It is difficult to complete the fabrication of large-size three-dimensional nanodevices. The scanning speed of a galvanometer scanner is much higher than that of the piezoelectric platform, but it can only implement two-dimensional scanning. Aiming at the above problems, a PPI laser direct writing lithography system with two scanning devices of a highspeed galvanometer scanner and a three-dimensional translational piezoelectric platform is designed in this paper. Our system has three operation modes, including piezoelectric platform scanning mode, galvanometer scanning mode, and composite processing mode, which are suitable for different nanodevice fabrication requirements.Methods In the experiments, a photoresist with 7-diethylamino-3-thenoylcoumarin(DETC) as an initiator is selected in fabrication. As a typical photoresist initiator used in PPI laser direct writing lithography, DETC induces the depolymerization reaction in the photoresist through the stimulated emission depletion effect to achieve smal

关 键 词：激光技术 光学制造 受激发射损耗 激光直写 微纳光学器件 

分 类 号：O439[机械工程—光学工程]