激光辅助化学气相沉积研究进展  

Research progress of laser-assisted chemical vapor deposition

作　　者：范丽莎 刘帆 吴国龙 Volodymyr S.Kovalenko 姚建华 Fan Lisha;Liu Fan;Wu Guolong;Volodymyr S.Kovalenko;Yao Jianhua(Institute of Laser Advanced Manufacturing,Zhejiang University of Technology,Hangzhou,Zhejiang 310023,China;College of Mechanical Engineering,Zhejiang University of Technology,Hangzhou,Zhejiang 310023,China;Collaborative Innovation Center of High-End Laser Manufacturing Equipment(National 2011 Plan),Zhejiang University of Technology,Hangzhou,Zhejiang 310023,China;Laser Technology Research Institute,National Technical University of Ukraine,Kiev 03056,Ukraine)

机构地区：[1]浙江工业大学激光先进制造研究院,浙江杭州310023 [2]浙江工业大学机械工程学院,浙江杭州310023 [3]高端激光制造装备省部共建协同创新中心,浙江杭州310023 [4]乌克兰国立科技大学激光技术研究所,乌克兰基辅03056

出　　处：《光电工程》2022年第2期1-29,共29页Opto-Electronic Engineering

基　　金：国家自然科学基金资助项目(51975533);高等学校学科创新海外引智计划项目(国家“111计划”,D16004)。

摘　　要：激光化学气相沉积技术(LCVD)相较于传统化学气相沉积技术具有低沉积温度、高膜层纯度、高沉积效率等特点,在各类功能薄膜材料制备上有着巨大的应用前景。围绕激光化学气相沉积技术,本文详细阐述了激光热解离、激光光解离与激光共振激发解离作用机制,同时介绍了各类LCVD的常用设备,着重总结了LCVD在金属材料、碳基材料、氧化物材料以及半导体材料等各类材料制备应用上的最新研究进展,特别介绍了LCVD制备过程中常用的检测与分析方法,最后讨论了激光化学气相沉积技术目前所面临的挑战与机遇,并展望了该技术的发展前景。Laser chemical vapor deposition(LCVD)technology has its unique advantages in reducing deposition temperatures,enhancing film purity and directly writing complex thin film patterns compared with conventional chemical vapor deposition(CVD).This technology has been widely applied in thin film deposition and attracted growing attention from both research and industries.This review categorizes the LCVD technology into three types according to the laser-matter interaction mechanisms,including laser pyrolysis,laser photolysis,and laser resonance excitation sensitization.We illustrate the deposition principles governed by the three different mechanisms in detail,and briefly introduce the commonly used equipment,and summarize the latest research progress of LCVD technology in synthesis and applications of metals,carbon-based materials,oxides and semiconductors.The detection and analysis methods used in LCVD are specially introduced,and the challenges and prospects of LCVD in material synthesis are discussed.

关 键 词：激光化学气相沉积 薄膜制备 热解离 光解离 共振激发解离 

分 类 号：TB383.2[一般工业技术—材料科学与工程] TM26[电气工程—电工理论与新技术]