国内外光刻胶发展概述  

Summary of Photoresist Development at Domestic and Abroad

作　　者：苏义旭 马亮亮 SU Yi-xu;MA Liang-liang(Origin Quantum Computing Technology Co.,Ltd.,Hefei 340000,China)

机构地区：[1]合肥本源量子计算科技有限责任公司,安徽合肥340000

出　　处：《化工管理》2022年第7期62-64,共3页Chemical Engineering Management

摘　　要：光刻胶是半导体器件生产过程中至关重要的化学品,国内外均对该产品的研发投入大量人力物力。文章从光刻胶的主要成分树脂为出发点,对光刻胶的种类进行了分类综述。对国内市场的光刻胶研发情况进行了简述,并对促进光刻胶研发进度提出几点建议。Photoresist is one of the most important chemicals in semiconductor device production.In this paper,the types of photoresist were reviewed based on the polymer types of the main components.The development situation of photoresist in domestic market was briefly introduced and some suggestions were put forward to promote the development progress of photoresist.

关 键 词：光刻胶 聚合物 IC行业 

分 类 号：N19[自然科学总论]