超精密空间分离式外差利特罗平面光栅编码器位移测量系统  

Ultra-precision spatial-separated heterodyne Littrow grid encoder displacement measurement system

作　　者：王磊杰[1] 郭子文 叶伟楠[1] 张鸣[1] 朱煜[1] WANG Leijie;GUO Ziwen;YE Weinan;ZHANG Ming;ZHU Yu(State Key Laboratory of Tribology&Beijing Key Lab of Precision/Ultra-precision Manufacturing Equipments and Control,Department of Mechanical Engineering,Tsinghua University,Beijing 100084,China)

机构地区：[1]清华大学机械工程系摩擦学国家重点实验室&精密超精密制造装备及控制北京市重点实验室,北京100084

出　　处：《光学精密工程》2022年第5期499-509,共11页Optics and Precision Engineering

基　　金：02国家重大科技专项资助项目(No.2017ZX02102004,No.2018ZX02101003)。

摘　　要：面向浸没式光刻机双工件台的超精密位置测量应用需求,提出了一种超精密空间分离式外差利特罗平面光栅编码器位移测量系统。给出了测量系统的原理与方案设计、系统各部件的设计及制造、编码器测量原理推导及实验验证等。所设计平面光栅编码器位移测量系统的相位卡的细分率为4096,测量分辨率为x50 pm/z25 pm。实验结果表明:该平面光栅位移测量系统可实现x向和z向位移的同时测量,z向运动行程为±1 mm,满足光刻机双工件台的垂向调焦需求;Rx/Ry/Rz单轴转动或三轴联合转动极限转角为±1.5 mrad时,交流信号质量仍然满足测量要求,光刻机双工件台的Rx/Ry/Rz的调平转动满足需求。所设计的平面光栅编码器位移测量系统能够实现光刻机双工件台相应的测量功能且具有较高的性能指标。An ultra-precision spatial separation heterodyne littrow grating encoder displacement measurement system was proposed to meet the requirements of an ultra-precision position measurement of dual workpiece table of immersion lithography machine.This study mainly includes the principle and scheme design of the measurement system,the design and manufacture of each component of the system,the measurement principle derivation of the encoder,and the test verification.The subdivision rate of the phase card of the displacement measurement system of the designed planar grating encoder was 4096,and the measurement resolution was x50 pm/z25 pm.The experimental results showed that the planar grating displacement measurement system can measure the x and z direction displacement simultaneously,and the z direction motion stroke was±1 mm,which met the vertical focusing requirements of the dual workpiece of the lithography machine.When the limit rotation angle of Rx/Ry/Rz uniaxial rotation or triaxial combined rotation was±1.5 mrad,the AC signal quality still met the measurement requirements.Moreover,it met the requirements of Rx/Ry/Rz leveling rotation of the dual workpiece table of lithography machine.To summarize,the displacement measurement system of the designed planar grating encoder met the corresponding measurement requirements of the photoengraving machine dual workpiece table and achieved higher performance indexes.

关 键 词：浸没式光刻机 位移测量 平面光栅编码器 空间分离 外差 利特罗角 

分 类 号：TH741[机械工程—光学工程] TP274[机械工程—仪器科学与技术]