大面积纳米压印技术及其器件应用  

Large-area nanoimprint lithography:processes and device applications

作　　者：高晓蕾 陈艺勤 郑梦洁 段辉高 GAO Xiaolei;CHEN Yiqin;ZHENG Mengjie;DUAN Huigao(National Engineering Research Center for High-Efficiency Grinding,College of Mechanical and Vehicle Engineering,Hunan University,Changsha 410082,China;Jiangsu Key Laboratory for Design and Manufacture of Micro-Nano Biomedical Instruments,Southeast University,Nanjing 211189,China;Jihua Laboratory,Foshan 528000,China)

机构地区：[1]湖南大学机械与运载工程学院国家高效磨削工程技术研究中心,湖南长沙410082 [2]东南大学江苏省微纳生物医疗器械设计与制造重点实验室,江苏南京211189 [3]季华实验室,广东佛山528000

出　　处：《光学精密工程》2022年第5期555-573,共19页Optics and Precision Engineering

基　　金：国家自然科学基金资助项目(No.51805160,No.12104182);广东省基础与应用基础研究基金区域联合基金项目(No.2020A1515110971);东南大学江苏省微纳生物医疗器械设计与制造重点实验室开放研究基金资助课题(No.KF202001)。

摘　　要：大面积纳米压印技术是一种利用模板压印方法大规模制备大面积微纳米结构的图形化技术,具有重复性好、成本低及结构分辨率高等优点。对各类聚合物及介质的快速结构成型使得大面积纳米压印技术在制备微纳光学、光电器件方面具有独特的优势,可应用于发光二极管、显示器、增强现实光波导及微流控芯片等众多领域,并在纳米技术商业化中发挥关键作用。首先对纳米压印技术进行介绍,然后从大面积纳米压印技术、大面积压印模板制备、大面积纳米压印技术的器件应用及其前景与挑战四个方面来介绍大面积纳米压印技术。Large-area nanoimprint lithography is a patterning technology for fabricating micro-/nano-structures on a large scale with good repeatability,low cost,and high resolution.These advantages of rapidly constructing various polymers make large-area nanoimprint lithography a unique technology for the fabrication of micro/nano optical and optoelectronic devices for several applications,such as light emitting diodes,displays,augmented reality waveguides,and microfluidic devices.Therefore,large-area lithography is crucial for the commercialization of nanotechnologies.This review summarizes recent developments in the field of large-area nanoimprint lithography,including basic processes,fabrication methods for imprint molds,and typical device applications.Lastly,the prospects and challenges for large-area nanoimprint lithography are discussed.

关 键 词：纳米压印 大面积压印模板 大面积图形化 器件应用 

分 类 号：TN305.7[电子电信—物理电子学] TB383.1[一般工业技术—材料科学与工程]