TFT-LCD一种条纹Mura的研究与改善  

Analysis and Improvement of Stripe Mura in TFT-LCD

作　　者：张正林 曹淑辉 王炎 吕琛 封振宇[2] ZHANG Zhenglin;CAO Shuhui;WANG Yan;LYU Chen;FENG Zhenyu(Nanjing BOE Display Technology Co.,Ltd.,Nanjing 210033,CHN;School of Chemistry and Chemical Engineering,Shandong University,Jinan 250100,CHN)

机构地区：[1]南京京东方显示技术有限公司,南京210033 [2]山东大学化学与化工学院,济南250100

出　　处：《光电子技术》2022年第1期47-52,共6页Optoelectronic Technology

摘　　要：针对A机种生产过程中发生的一种条纹Mura问题,通过不良品的解析和数据统计分析,发现Mura异常区的黑色矩阵层(BM)图案边缘有内切(Undercut)问题,是因为制造过程中显影机导轮与玻璃接触部分发生静电累积,静电干扰使BM光阻与玻璃之间的接触角变小,造成显影后背面曝光工艺中BM未固化层发生热融溢流(Melt Flow)现象,固化工艺后形成BM边缘内切。研究发现,通过优化背面曝光工艺参数和关闭曝光上灯可以有效改善条纹Mura的程度;且将显影机导轮“平行式”排列改造成“之字式”排列,可以进一步改善条纹Mura现象。改善后条纹Mura的发生率由0.8%降至0,改善效果显著。Aiming at a kind of stripe Mura problem in the production process of A type,and through the study of defective products and the statistical analysis of the data,it was found that the black matrix layer(BM)pattern in Mura abnormal area had an undercut problem. Because of the accumulation of static electricity in the contact part between the developing machine guide wheel and the glass,the contact angle between BM light resistance and glass became smaller due to the electrostatic interference,and then melt flow occurred in the BM uncured layer in the back exposure process after developing,causing the BM undercut edge after curing process. It was found that the degree of stripe Mura could be effectively improved by optimizing the back exposure process parameters and turning off the exposure lamp. Besides,the Parallel arrangement of the guide wheel was changed into Zigzag arrangement,which could furtherly improve the bad phenomenon of stripe Mura. The incidence of stripe Mura decreased from 0.8% to 0,so the improving effect was remarkable.

关 键 词：条纹缺陷 内切 背面曝光 静电积累 “之字式”排列 

分 类 号：TN383[电子电信—物理电子学]