微波器件中绝缘膜的质量提升及工艺技术研究  

Research on Quality Improvement and Process Technology of Insulated Film in Microwave Devices

作　　者：张宇 李琳[1] 李枘 王宇[1] 马晓琳 Zhang Yu;Li Lin;Li Rui;Wang Yu;Ma Xiao-lin(The 29th Research Institute of CETC,Sichuan Chengdu 610000)

机构地区：[1]中国电子科技集团公司第二十九研究所,四川成都610000

出　　处：《电子质量》2022年第4期93-96,共4页Electronics Quality

基　　金：国防技术基础科研项目(项目编号:JSZL2018210A004)。

摘　　要：当前,随着军工产品逐渐向小型化、集成化的方向发展,微波器件的用量越来越大。由于微波器件自身工艺的特殊性,返修性较差,一旦出现质量问题,会导致内部精密器件报废,从而增加产品的制造成本与周期。该文主要针对微波器件中绝缘膜的质量提升进行研究,通过分析现有加工过程并找出问题根源,随后对比多种工艺提升方案并找出最优加工方案的方法,找出了导致短路现象的金属毛刺产生的根源,最终改进了工艺过程,提升了产品质量,并总结了相关经验。With the military products are turning smaller and more integrated,the amount is getting larger and larger.However,with the increasing of output,the requirements for production efficiency are getting higher and higher,which resulted in some quality problems that never occur in small-volume production.In this paper,we traces the root cause of the insulated film in microwave devices and analyzes the processes of it.Then,the root cause of metal burrs which lead to short-circuiting was founded,the processes was meliorated,and the quality was improved finally.Ultimately,we summarized the experience about the processes.

关 键 词：微波器件 绝缘膜 工艺 质量 

分 类 号：TN405[电子电信—微电子学与固体电子学]