石英玻璃片的化学抛光工艺研究  

Process Study on Chemical Polishing of Quartz Glass Slices

作　　者：汤英童[1] 杨长城[1] TANG Ying-tong;YANG Chang-cheng(Huazhong Institute of Electro-Optics—Wuhan National Laboratory for Optoelectronics,Wuhan 430223,China)

机构地区：[1]华中光电技术研究所-武汉光电国家研究中心,湖北武汉430223

出　　处：《光学与光电技术》2022年第2期159-164,共6页Optics & Optoelectronic Technology

摘　　要：石英玻璃是紫外光刻、激光核技术等精密光学系统的关键光学元件。石英玻璃在加工过程中易出现表面及亚表面损伤和蚀坑等缺陷问题,化学抛光能有效消除石英玻璃的亚表面损伤。介绍了石英玻璃片的化学抛光工艺原理和过程,利用正交实验法优化了石英玻璃化学抛光工艺参数,分析了化学抛光过程中抛光液成分、抛光液温度和抛光时间对石英玻璃片表面粗糙度的影响。实验结果表明,采用氟化氢铵、水和丙三醇配置的化学抛光液,在最优化的工艺参数时,石英玻璃片经过化学抛光,表面粗糙度可降到100 nm左右,可见光透过率最高可达到89%。为石英玻璃光学零件的化学抛光工艺提供了理论依据和技术支持。Quartz glass is one of the key optical components in the precision optical systems such as UV lithography and laser nuclear technology. The chemical polishing method is proposed to solve the defect issues of the surface or sub-surface damages and etch pits which easily occur in the quartz glass during the machining process. The chemical polishing principle and the working process of quartz glass slices are introduced in this paper. The orthogonal experiment method is used to optimize the chemical polishing process parameters for the quartz glass slices,and the effects of main ingredients of chemical polishing fluid,temperature of polishing fluid and polishing time on the surface roughness are analyzed. The results show that the surface average roughness and the highest transmittanceof quartz glass slices,polished by the mixed solution of NH4HF2and additive glycerol,can reach about 100 nm and 89%,respectively.

关 键 词：石英玻璃 亚表面损伤层 化学抛光 表面粗糙度 工艺 

分 类 号：TG174.4[金属学及工艺—金属表面处理]