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作 者:朱蓓蓓 刘青 秦琳 楚建宁 陈肖 汪学方[2] 许剑锋[2] ZHU Bei-bei;LIU Qing;QIN Lin;CHU Jian-ning;CHEN Xiao;WANG Xue-fang;XU Jian-feng(Shanghai Institute of Aerospace Control Technology,Shanghai 201109,China;School of Mechanical Science and Engineering,Huazhong University of Science and Technology,Wuhan 430074,China)
机构地区:[1]上海航天控制技术研究所,上海201109 [2]华中科技大学,机械科学与工程学院,湖北武汉430074
出 处:《真空》2022年第2期55-61,共7页Vacuum
基 金:装发部“十三五”装备预研共同技术项目(41423060208-HUST)。
摘 要:半球谐振子金属化镀膜是半球谐振陀螺制造的重要工艺环节。镀膜过程所产生的薄膜残余应力对谐振子Q值有较大影响,决定着半球谐振陀螺零偏稳定性等最终性能。本文采用X射线衍射法测量薄膜残余应力,研究了镀膜工艺参数和膜层厚度对残余应力的影响,结果表明:薄膜残余应力均呈压应力状态;随着沉积速率的增大,薄膜应力先增大后减小,有转化为拉应力的趋势;随着膜层厚度的增加,薄膜应力先略微减小再增大;基底温度对残余应力的影响无明显规律。本文的研究对薄膜残余应力与谐振子Q值关系模型的建立具有重要指导意义。The hemispherical resonator metallization coating is an important process in the manufacture of hemispherical resonator gyroscope. The residual stress of the film produced during the coating process has a great influence on theQvalue of the resonator, which determines the final performance of the hemispherical resonator gyroscope, such as the stability of the bias. In this paper, X-ray diffraction method is used to measure the residual stress of the film, and the influence of the coating process parameters and the thickness of the film on the residual stress is studied. The results show that the film residual stress exhibits a state of compressive stress. As the sputtering power increases, the film stress increases first and then decreases, and there is a tendency to transform into tonsile stress. When the film thickness increases, the film stress first decreases slightly and then increases. The substrate temperature has no obvious regularity in the influence of the residual stress. The research in this paper may have important guiding significance for the establishment of the relationship model between the residual stress of the film and theQvalue of the harmonic oscillator.
分 类 号:TB383[一般工业技术—材料科学与工程]
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