芯片制造语境下的计算光刻技术  

Computational Lithography Technology Under Chip Manufacture Context

作　　者：施伟杰 俞宗强 蒋俊海 车永强 李思坤[3] Shi Weijie;Yu Zongqiang;Jiang Junhai;Che Yongqiang;Li Sikun(Dongfang Jingyuan Electronic Technology(Beijing)Co.,Ltd.,Beijing 100176 China;Semiconductor Manufacturing North China(Beijing)Corporation,Beijing 100176,China;Laboratory of Information Optics and Opto‐Electronic Technology,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China)

机构地区：[1]东方晶源微电子科技(北京)有限公司,北京100176 [2]中芯北方集成电路制造(北京)有限公司,北京100176 [3]中国科学院上海光学精密机械研究所信息光学与光电子技术实验室,上海201800

出　　处：《激光与光电子学进展》2022年第9期1-14,共14页Laser & Optoelectronics Progress

摘　　要：计算光刻技术是提高分辨率的重要手段,是连接芯片设计与制造的桥梁。首先,介绍了计算光刻技术的起源即第1代光学邻近效应校正(OPC)技术,基于规则的OPC;随后,以14 nm芯片制造过程为例介绍了现代芯片制造采用的各种计算光刻技术,包括基于模型的第2代OPC技术、光源掩模联合优化技术、二次成像图形拆分技术。最后,介绍了计算光刻的发展趋势,包括反向光刻技术、曲线掩模、人工智能应用及协同优化。综合芯片设计、制造、检测的集成优化将是未来计算光刻发展的主要方向。Computational lithography technology plays crucial roles in enhancing resolution.It bridges the gap between chip design and manufacturing processes.In this study,first,rule-based optical proximity correction(OPC)was introduced as the first generation of OPC and the origin of computational lithography.Second,model-based OPC,source mask cooperation,and double patterning technology were introduced under the 14-nm IC manufacturing context.Finally,the trend of computational lithography was discussed and inverse lithography technology,curvilinear masks,AI-based OPCs,and holistic process optimizations were introduced.Integrated optimization of chip design,manufacturing and inspection offers broad prospects for computational lithography.

关 键 词：计算光刻 光学邻近效应校正 全景优化 反向光刻 

分 类 号：TN405[电子电信—微电子学与固体电子学]