一种载片刚性转架的动平衡校准探析  

The Analysis of Dynamic Balance Calibration on Wafer-Loaded Rigid Cassette Carrier

作　　者：于高洋[1] 陶利权[1] 杨晓静[1] YU Gaoyang;TAO Liquan;YANG Xiaojing(The 45th Research Institute of CETC,Beijing 100176,China)

机构地区：[1]中国电子科技集团公司第四十五研究所,北京100176

出　　处：《电子工业专用设备》2022年第2期66-70,共5页Equipment for Electronic Products Manufacturing

摘　　要：旋转冲洗甩干机是半导体湿法清洗工艺中的主流设备之一,其关键技术之一,是如何克服该设备中载片刚性转架在高速旋转时产生的振动,从而引发盒装晶圆片在冲洗、干燥工艺流程中易出现碎片、干燥不彻底等现象,为此,对载片刚性转架结构的构建、转动不平衡修正、动平衡验证等方面进行分析探究。Spin Rinsing Dryer(SRD)is one of the major tools in semiconductor wet cleaning process.One of the key technologies is solving the vibration that results in wafer fragment and incomplete drying while the wafer-loaded rigid cassette carrier rotating at high speed.The methods to resolve the vibration are analyzed based on structuring of the rigid cassette carrier,calibrating for rotating imbalance and verification on dynamic balance.

关 键 词：旋转冲洗甩干 刚性 转架 动平衡 

分 类 号：TN305[电子电信—物理电子学]