自支撑Al滤光片的制备  

Preparation of Self-supporting Al Filter

作　　者：唐吉龙 徐雄伟 陈田祥[2] 高娜 曹杰葳 李琳[3] TANG Jilong;XU Xiongwei;CHEN Tianxiang;GAO Na;CAO Jiewei;LI Lin(State Key Laboratory of High Power Semiconductor Laser,Changchun University of Science and Technology,Changchun 130022,China;Particle Astrophysics Division,Institute of High Energy Physics,Chinese Academy of Sciences,Beijing 100049,China;College of Mathematics and Physics,Beijing University of Chemical Technology,Beijing 100029,China)

机构地区：[1]长春理工大学高功率半导体激光国家重点实验室,长春130022 [2]中国科学院高能物理研究所粒子天体物理中心,北京100049 [3]北京化工大学数理学院,北京100029

出　　处：《光子学报》2022年第6期266-274,共9页Acta Photonica Sinica

基　　金：国家自然科学基金(No.11203025);北京市自然科学基金(No.1202025);中国科学院空间科学战略性先导科技专项(No.XDA15020501)。

摘　　要：分别以AZ50XT和聚乙烯醇为脱膜剂,在本底真空度为5.0×10^(-4) Pa的磁控溅射镀膜机中沉积Al膜,制备出厚度为80 nm的自支撑Al滤光片,并对滤光片进行表面缺陷分析。通过扫描电镜和CMOS相机观察得到,制备的Al滤光片表面均匀性较好,有少量针孔。对滤光片的光学性能进行了表征。用紫外可见分光光度计测得滤光片在可见光及红外光波段的透过率低于0.02%,基本满足使用要求。用软X射线透过率测试系统测得滤光片在1.6~10 keV能段的透过率高于90%,透过率曲线与理论结果基本一致,满足应用要求。用同步辐射装置测得两种滤光片在50~250 eV能段的最高透过率分别为53%和35%,受Al膜表面氧化和脱膜剂残留的影响,实际测得的透过率比理论计算值偏低。The self-supporting metal film is very important in the observation of X-ray and extreme ultraviolet bands.When the X-ray and extreme ultraviolet telescopes are used to observe the corresponding bands,the detector is usually disturbed by visible and infrared light and other stray light,they affect its detection accuracy and performance.Therefore,it is necessary to add filters in front of the detector,the filters are usually hundreds of nanometers of metal film.The preparation of self-supporting thin films is usually deposited on some special substrates,and then the substrate is removed to obtain the required self-supporting thin films.At present,there are two main methods for obtaining self-supporting films,one is substrate etching;the other is the release agent.The substrate etching process is complex,and the method of release agent is simple and easy to implement.Therefore,this study uses the method of release agent to prepare the self-supporting Al filter.The release agent used in the past is very easy to dissolve,such as NaCl,CsI,etc.,and they are easy to bring defects to the film deposited on the release agent.In this paper,AZ50XT photoresist and polyvinyl alcohol are used as release agents.They have good film-forming properties,stable performance,and are good release agent materials.To make the self-supporting Al film have a regular shape and easy to test,it is necessary to prepare a nickel supporting frame.We copied the nickel frame pattern on clean Si wafer by two mask lithography,and then prepared the nickel frame by the micro-electroforming process.After preparation,the nickel frame was removed for use.The thickness of the nickel frame is about 60~70μm,the inner diameter is 16 mm,the outer diameter is 28 mm.The interface between the nickel frame and the sample is smooth and easy to bond.In the experiment,AZ50XT photoresist and polyvinyl alcohol release layers were prepared on clean Si substrate by spin coater,and then dried on the heating table.After the sample was cooled to room temperature,placed it

关 键 词：薄膜 自支撑 脱膜剂 软X射线 极紫外 透过率 

分 类 号：P171.3[天文地球—天文学]