Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure  

作　　者：Zhuofei Gan Hongtao Feng Liyang Chen Siyi Min Chuwei Liang Menghong Xu Zijie Jiang Zhao Sun Chuying Sun Dehu Cui Wen-Di Li 

机构地区：[1]Department of Mechanical Engineering,University of Hong Kong,Hong Kong,China [2]School of Microelectronics,Southern University of Science and Technology,Shenzhen,China

出　　处：《Light(Science & Applications)》2022年第5期832-841,共10页光（科学与应用)（英文版）

基　　金：partially supported by the Research Grants Council of the Hong Kong Special Administrative Region(Awards no.17207419,17209320,C7018-20G,and AoE/P-701/20);the Platform Technology Funding program,and the Seed Funding Program for Basic Research(202011159235 and 202010160046);the University of Hong Kong,and Shenzhen Government(Grant no.K20799112).

摘　　要：Functional nanostructures are exploited for a variety of cutting-edge fields including plasmonics,metasurfaces,and biosensors,just to name a few.Some applications require nanostructures with uniform feature sizes while others rely on spatially varying morphologies.However,fine manipulation of the feature size over a large area remains a substantial challenge because mainstream approaches to precise nanopatterning are based on low-throughput pixel-by-pixel processing,such as those utilizing focused beams of photons,electrons,or ions.In this work,we provide a solution toward wafer-scale,arbitrary modulation of feature size distribution by introducing a lithographic portfolio combining interference lithography(IL)and grayscale-patterned secondary exposure(SE).Employed after the high-throughput IL,a SE with patterned intensity distribution spatially modulates the dimensions of photoresist nanostructures.Based on this approach,we successfully fabricated 4-inch wafer-scale nanogratings with uniform linewidths of<5%variation,using grayscale-patterned SE to compensate for the linewidth difference caused by the Gaussian distribution of the laser beams in the IL.Besides,we also demonstrated a wafer-scale structural color painting by spatially modulating the filling ratio to achieve gradient grayscale color using SE.

关 键 词：LITHOGRAPHY DIMENSIONS spatially 

分 类 号：TB383[一般工业技术—材料科学与工程]