低电压电沉积类金刚石碳膜的研究  

Study on Low Voltage Electrodeposition of Diamond-like Carbon Film

作　　者：王历 吴敏娴 李珺 陈艳丽 王文昌[1] 陈智栋[1] Li Wang;Min-Xian Wu;Jun Li;Wen-Chang Wang;Zhi-Dong Chen(School of petrochemical engineering,Changzhou University,Changzhou 213164,Jiangsu,China)

机构地区：[1]常州大学石油化工学院,江苏常州213164

出　　处：《电化学》2022年第6期62-69,共8页Journal of Electrochemistry

基　　金：国家自然基金项目(No.51874050);常州市科技项目(No.CJ20210139,No.CZ20200038)资助

摘　　要：采用电化学沉积法,在较低电压下(4.0~8.0 V)以甲酸作为主要碳源,甲酸钠作为辅助碳源,二甲基亚砜与去离子水作为溶剂,在不锈钢表面制备了类金刚石碳薄膜,研究了沉积电压对碳膜形貌和成分的影响。电化学沉积含氢类金刚石碳薄膜致密、均匀,膜的电导率与沉积电压呈负相关关系,电导率介于金属与半导体之间。拉曼光谱在1332 cm^(-1)处出现金刚石的特征峰,sp^(3)碳成分随沉积电压的增加而增加。傅里叶红外变换光谱显示沉积的类金刚石碳膜为含氢碳膜。X射线光电子能谱分析显示这些薄膜中存在sp^(2)和sp^(3)键碳原子。Diamond-like carbon(DLC)films are receiving a lot of attention from the scientific community,thanks to the promise of DLC films for applications in microelectronics and optoelectronics.Usually,electrodeposition is the preferred common technique because of low cost,large deposition area and simplicity of the setup.However,when carbon films are electrodeposited on a stainless steel,high cell voltages(≥1000 V)are required owing to the low electric conductivity of the organic solvents.This work has developed a new electrolyte system that could achieve carbon deposition on a stainless steel under a low applied cell voltage.The DLC films were electrodeposited from 230 g·L^(-1 )formic acid and 17 g·L^(-1 )sodium formate in 1:1(v/v)water-dimethyl sulfoxide mixture with the applied voltages ranged from 4.0 V to 8.0 V on the stainless steel substrate.The effects of the applied voltage on film morphology have been investigated.Dimethyl sulfoxide(DMSO)can broaden the electrochemical window of the solvents,inhibit hydrogen evolution and improve current efficiency.Nevertheless,the current efficiency was still low.X-ray photoelectron spectroscopy(XPS),scanning electron microscopy(SEM),Raman spectroscopy,Fourier transform infrared(FTIR)spectroscopy,probe surface profiler,and four-point probe resistivity tester were employed to analyze the structure,morphology,surface chemical composition,film thickness,and electric conductivity of the DLC films.It was found that the dense and uniform hydrogenated DLC films were successfully prepared on the stainless steel substrate.The film thickness was sensitive to the cell voltage and decreased with the increase in cell voltage.The Raman spectra of these films indicated the three broad peaks.Presences of D and G peaks near 1330 cm^(-1) and 1570 cm^(-1),respectively,revealed that the as-deposited films were typical DLC films.The average grain size and sp^(3) carbon content of the film increased with the increase in deposition voltages.The FTIR results showed that the peaks observed at 2850

关 键 词：低电压 电化学沉积 类金刚石碳膜 不锈钢 二甲基亚砜 

分 类 号：TG174.4[金属学及工艺—金属表面处理]