基于数字微镜器件的无掩模数字光刻技术研究进展  

Research Progress of Maskless Digital Lithography Based on Digital Micromirror Device

作　　者：谢芳琳 王雷[1] 黄胜洲 Xie Fanglin;Wang Lei;Huang Shengzhou(School of Mechanical Engineering,Anhui Polytechnic University,Wuhu 241000,Anhui,China)

机构地区：[1]安徽工程大学机械工程学院,安徽芜湖241000

出　　处：《激光与光电子学进展》2022年第11期141-150,共10页Laser & Optoelectronics Progress

基　　金：安徽省自然科学基金(2008085QE258,1808085QA12,1808085ME117);安徽省自然科学重点研究项目(KJ2019A0156);安徽工程大学增材制造研究项目(2020ybxm08);安徽工程大学人才引进科研基金(2018YQQ027)。

摘　　要：无掩模光刻技术具有无需物理掩模、成本低、适合大批量生产的优点,在微结构制作中得到了广泛应用。基于数字微镜器件(DMD)的无掩模数字光刻技术具有分辨率高、灵活性好、加工精度高等优势,成为近年来数字光刻领域的研究热点。综述了DMD数字光刻技术的研究进展,包括基于DMD的扫描光刻技术、步进式光刻技术以及灰阶光刻技术,介绍了该方法在集成电路、微光学、三维打印等领域的应用,并总结了目前DMD光刻技术存在的问题及其未来发展趋势。Maskless lithography has a wide range of applications in microstructure fabrication due to its advantages of no physical mask,low cost and suitability for mass production.Maskless digital lithography based on digital micromirror device(DMD)has the advantages of high resolution,good flexibility and high processing accuracy,which has become a research hotspot in the field of lithography in recent years.This paper reviews the research progress of DMD digital lithography,including DMDbased scanning lithography,stepping lithography and grayscale lithography,and introduces the applications of the method in integrated circuit,microoptics,threedimensional printing and other fields,the paper also summarizes the current problems of DMD lithography and its future development trend.

关 键 词：光学设计 无掩模 数字微镜器件 扫描光刻技术 步进式光刻技术 灰阶光刻技术 

分 类 号：O436[机械工程—光学工程]