聚氨酯/炭黑微孔膜的制备及其在化学机械抛光中的应用  

Preparation of Polyurethane/Carbon Black Microporous Membrane and Its Application in Chemical Mechanical Polishing

作　　者：冯见艳 刘丽成 李鹏妮 陈浩聪 相红旗 罗晓民 FENG Jian-yan;LIU Li-cheng;LI Peng-ni;CHEN Hao-cong;XIANG Hong-qi;LUO Xiao-min(College of Bioresources Chemical and Materials Engineering,Shaanxi University of Science&Technology,Xi'an 710021,China;Tongxiang Affairs Center of Quality and Technical Supervision,Tongxiang 314599,China;Ningbo Inventech New Materials Co.,Ltd.,Yuyao 315410,China;Ningbo Jiangfeng Electronic Materials Co.,Ltd.,Yuyao 315400,China)

机构地区：[1]陕西科技大学轻工科学与工程学院,陕西西安710021 [2]桐乡市质量技术监督事务中心,浙江桐乡314599 [3]宁波赢伟泰科新材料有限公司,浙江余姚315410 [4]宁波江丰电子材料股份有限公司,浙江余姚315400

出　　处：《塑料科技》2022年第5期47-52,共6页Plastics Science and Technology

基　　金：国家自然科学基金项目(21978163);陕西省科技厅自然科学基础研究计划项目(2019JM-555);浙江省领军创新项目(2019R01016)。

摘　　要：采用PU/DMF/H2O湿法交换技术,制备聚氨酯/炭黑(PU/CB)复合微孔膜,探究浆料中的CB添加量对PU/CB微孔膜的形态结构与性能的影响。通过化学机械抛光测试(CMP),对比自制抛光垫(H-CP)与国产抛光垫(CH-1)的抛光性能。结果表明:当CB添加量为9%,PU/CB的耐磨性达到0.0058 g/3500r,其拉伸强度4.49 MPa,并具有一定的导热性。去除速率(RR)与粗糙度变化(ΔR_(a))结果表明,H-CP比CH-1具有更优异的稳定性和抛光性能。Polyurethane/carbon black(PU/CB) composite microporous membrane was prepared by PU/DMF/HO wet exchange technology. The effects of the amount of CB in composite on the morphology, structure and properties of PU/CB microporous membrane were investigated. The chemical mechanical polishing(CMP) test was carried out to compare the polishing performance of the self-made polishing pad(H-CP) and the domestic polishing pad(CH-1). The results show that when the content of CB is 9%, the wear resistance of the microporous membrane reaches 0.005 8 g/3 500r, its tensile strength is 4.49 MPa, and certain thermal conductivity is observed for the membrane. The CMP results show that the H-CP pad is of better stability in polishing removal rate and pad surface roughness than domestic polishing pad(CH-1).

关 键 词：聚氨酯 炭黑 相转化 耐磨性 导热性能 化学机械抛光 

分 类 号：TB332[一般工业技术—材料科学与工程] TQ323.8[化学工程—合成树脂塑料工业]