两种微米金刚石聚晶颗粒薄膜的制备与场发射研究  

Preparation and Field Emission Study of Two Kinds of Micron Diamond Polycrystalline Particle Films

作　　者：高金海 张洁[1] 李成刚 张兵临 GAO Jinhai;ZHANG Jie;LI Chenggang;ZHANG Jinglin(College of Physics and Electronic Engineering,Zhengzhou Normal University,Zhengzhou 450044,CHN;Key Laboratory of Material Physics of the Ministry of Education,College of Physical Engineering,Zhengzhou University,Zhengzhou 450052,CHN)

机构地区：[1]郑州师范学院物理与电子工程学院,郑州450044 [2]郑州大学物理工程学院材料物理教育部重点实验室,郑州450052

出　　处：《半导体光电》2022年第3期573-577,共5页Semiconductor Optoelectronics

基　　金：教育部科学技术重点资助项目(205091);2018年河南省科技厅科技攻关项目(182102210140);2018年河南省重点研发与推广专项项目(182102210564);2017年度河南省科技计划项目(172102210115)。

摘　　要：采用微波等离子体化学气相沉积,在不同的沉积条件下得到两种微米金刚石颗粒薄膜,通过拉曼光谱仪和X射线仪分析了两种薄膜的成分,用扫描电子显微镜分析了两种薄膜的表面形貌,用二级结构的场发射装置研究了薄膜的场发射性能,最终分析并讨论了场发射性能优异的微米金刚石薄膜的特征。Two kinds of micron diamond grain thin film were obtained by microwave plasma chemical vapor deposition method under different conditions.The composition of the two kinds of thin film were analyzed by Raman spectroscopy and X-ray apparatus,and the surface morphology was analyzed by scanning electron microscope(SEM),and the field emission performance was studied by the field emission device with secondary structure.Finally,the characteristics of micron diamond films with excellent field emission properties were analyzed and discussed.

关 键 词：微波等离子体化学气相沉积 微米金刚石聚晶薄膜 场发射 

分 类 号：TB383[一般工业技术—材料科学与工程] O484[理学—固体物理]