Conjugated Polymers for Combatting Antimicrobial Resistance  

作　　者：Zijuan Wang Hao Geng Chenyao Nie Chengfen Xing 

机构地区：[1]School of Materials Science and Engineering,Hebei University of Technology,Tianjin 300130,China [2]Key Laboratory of Biotechnology and Pharmaceutical Engineering,School of Pharmaceutical Sciences,Cixi Biomedical Research Institute,Wenzhou Medical University,Wenzhou,Zhejiang 325035,China [3]Key Laboratory of Hebei Province for Molecular Biophysics,Institute of Biophysics,Hebei University of Technology,Tianjin 300130,China

出　　处：《Chinese Journal of Chemistry》2022年第6期759-772,共14页中国化学（英文版）

基　　金：The authors are grateful for the financial support of the National Natural Science Foundation of China(Nos 21773054,21905072,and 22077025);the Natural Science Foundation of Hebei Province(Nos.B2020202062,B2020202086)。

摘　　要：Antimicrobial resistance(AMR)is one of the major challenges in pathogenic infections,which endangers human health and brings devastating public health threats.Therefore,developing new materials to reduce the over-reliance on antibiotics or to replace antibiotics is in great need to solve this problem.Conjugated polymers(CPs)with excellent light-harvesting properties and good biocompatibility are ideal candidate materials for combat-ting AMR through photodynamic antimicrobial therapy(PACT)by sensitizing oxygen and photothermal therapy(PTT)by light to heat conversion.Sig-nificant works of CPs-based antimicrobial approaches have been reported in recent years.Herein,we summarize the types of CPs-based antimicrobial materials,illustrate their antimicrobial mechanisms,and discuss their applications in combating AMR mainly by PACT or antimicrobial PTT.In addi-tion,we proposed some other antimicrobial treatment strategies based on CPs,hoping to provide inspiring insight for overcoming AMR.

关 键 词：POLYMERS Antimicrobial resistance PHOTOCHEMISTRY Materials science PHOTOTHERAPY 

分 类 号：O63[理学—高分子化学]