Advanced Mueller matrix ellipsometry:Instrumentation and emerging applications  

作　　者：CHEN XiuGuo GU HongGang LIU JiaMin CHEN Chao LIU ShiYuan 

机构地区：[1]State Key Laboratory of Digital Manufacturing Equipment and Technology,Huazhong University of Science and Technology,Wuhan 430074,China [2]Optics Valley Laboratory,Wuhan 430074,China

出　　处：《Science China(Technological Sciences)》2022年第9期2007-2030,共24页中国科学（技术科学英文版）

基　　金：supported by the National Natural Science Foundation of China(Grant Nos.51727809,52022034,62175075,and 52130504);the Key Research and Development Plan of Hubei Province(Grant Nos.2020BAA008 and 2021BAA013)。

摘　　要：Mueller matrix ellipsometry(MME)provides the 4×4 Mueller matrix of a sample under test,which determines how the state of polarization is changed as light interacts with the sample.Due to the redundant information contained in the Mueller matrix,MME has gained more and more extensive applications in the characterization of surfaces,interfaces,thin films,and nanostructures.In addition,the instrumentation of MME has also achieved great developments since its advent in the 1970 s.In this paper,we will first review the basic principle as well as the common system layouts of MME for the full Mueller matrix measurement.Then,the basic procedure of ellipsometry data analysis is reviewed.After that,some new developments in MME in our lab for different applications are introduced,including the broadband MME,the high-resolution imaging MME,and the high-speed MME.Some emerging applications of the developed MMEs are also presented.Conclusions and perspectives of the advanced ellipsometry are finally drawn and discussed.

关 键 词：ELLIPSOMETRY Mueller matrix Mueller matrix ellipsometry imaging ellipsometry high-speed ellipsometry 

分 类 号：TH74[机械工程—光学工程]