基于磁过滤阴极真空弧沉积技术制备AlCrTiZrMo非晶高熵合金薄膜及其性能研究  

AlCrTiZrMo amorphous high entropy alloy thin films prepared by magnetic filter cathode vacuum arc deposition

作　　者：陈淑年 廖斌[1] 欧阳晓平 CHEN Shunian;LIAO Bin;OUYANG Xiaoping(College of Nucelear Science and Technology,Beijing Normal University,100875,Beijing,China)

机构地区：[1]北京师范大学核科学与技术学院,北京100875

出　　处：《北京师范大学学报（自然科学版）》2022年第5期674-680,共7页Journal of Beijing Normal University(Natural Science)

基　　金：国家自然科学基金资助项目(U1865206)。

摘　　要：基于磁过滤阴极真空弧沉积技术研究了负偏压对AlCrTiZrMo非晶高熵合金薄膜的形貌、元素以及微观结构的影响,进而讨论了AlCrTiZrMo非晶高熵合金薄膜的成膜及结晶机制.通过SEM、EDS、XRD和TEM对薄膜的形貌与结构等性能进行测试分析,实验结果表明:不同沉积离子能量条件下,薄膜具有优异的表面品质;随着沉积离子能量的不断增加,薄膜厚度随之减小;同时,沉积离子能量对高熵晶相的调控有明显效果,沉积离子能量的增加使AlCrTiZrMo高熵合金薄膜微结构从非晶相(am)转变为相稳定的am+FCC纳米复合结构.Effects of negative bias on morphology,elements and microstructure of AlCrTiZrMo amorphous high entropy alloy films were investigated by magnetic filter cathode vacuum arc deposition. Film formation and crystallization mechanism of AlCrTiZrMo amorphous high entropy alloy films were investigated. SEM,EDS,XRD and TEM were used to examine and analyze film morphology and structure. These films were found to have excellent surface quality under different ionic energy for deposition. With increasing energy,film thickness decreased. The deposition ion energy was found to have a significant effect on the regulation of crystal phase. An increase in deposition ion energy was found to change microstructure of AlCrTiZrMo high entropy alloy film from amorphous phase(am) to phase stable am +FCC nanocomposite structure.

关 键 词：磁过滤阴极真空弧 非晶高熵合金薄膜 沉积离子能量 

分 类 号：O472.3[理学—半导体物理]