掺氮超纳米金刚石-石墨烯杂化薄膜的制备及其生长机理研究  

Preparation and growth mechanism of nitrogen-dopedultra-nanodiamond-graphene hybrid films

作　　者：官磊 张文 王兵[1] 熊鹰 GUAN Lei;ZHANG Wen;WANG Bing;XIONG Ying(School of Materials Science and Engineering,Southwest University of Science and Technology,Mianyang 621010,China;State Key Laboratory for Environmental-Friendly Energy Materials,Southwest University ofScience and Technology,Mianyang 621010,China)

机构地区：[1]西南科技大学材料科学与工程学院,四川绵阳621010 [2]西南科技大学环境友好能源材料国家重点实验室,四川绵阳621010

出　　处：《功能材料》2022年第10期10185-10189,共5页Journal of Functional Materials

基　　金：国防基础科研计划项目(JCKY2019404C002);西南科技大学博士基金(19zx7127)。

摘　　要：金刚石-石墨烯杂化/复合材料兼具金刚石和石墨烯的优异性能,在储能、光电、生物传感器等领域有着重要的应用。近年来,大量的研究致力于这类材料的形成过程,但其生长机理仍不清楚。采用微波等离子体化学气相沉积(MPCVD)法,以有机小分子二异丙胺作为唯一碳、氮源制备了氮掺杂超纳米金刚石-石墨烯杂化薄膜。采用SEM、TEM、Raman、XRD等手段详细分析了杂化薄膜的微观形貌以及物相组成,并结合等离子体发射光谱(OES)对生长时基团种类及含量变化的原位测量,提出了可能的生长机理,为调控氮掺杂超纳米金刚石-石墨烯杂化薄膜的微观结构和性能提供理论依据。The diamond-graphene hybrid/composite materials have both the excellent properties of diamond and graphene,and are importantly applied in the fields of energy storage,optoelectronics,and biosensors.In recent years,a lot of researches have been devoted to the formation process of such materials,but the growth mechanism remains unclear.In this paper,nitrogen-doped ultra-nanodiamond-graphene hybrid films were prepared by microwave plasma chemical vapor deposition(MPCVD)method using small organic molecule diisopropylamine as the sole carbon and nitrogen source.The micromorphologies and phase compositions of the hybrid films were analyzed in detail by means of SEM,TEM,Raman,and XRD.Combined with the in-situ monitoring of the changes of group species and content during growth by plasma emission spectroscopy(OES),the possible growth mechanism was proposed,which provides a theoretical basis for regulating the microstructure and properties of nitrogen-doped ultra-nanodiamond-graphene hybrid films.

关 键 词：MPCVD 氮掺杂超纳米金刚石-石墨烯杂化薄膜 微观形貌 物相组成 生长机理 

分 类 号：TB74[一般工业技术—材料科学与工程] TB79[一般工业技术—真空技术] TB332