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作 者:辛先峰 刘林根 林国强[1] 董闯[1,2] 丁万昱 张爽[2] 王棋震 李军 万鹏[3] XIN Xian-feng;LIU Lin-gen;LIN Guo-qiang;DONG Chuang;DING Wan-yu;ZHANG Shuang;WANG Qi-zhen;LI Jun;WAN Peng(Dalian University of Technology,Dalian 116024,China;Dalian Jiaotong University,Dalian 116028,China;Foshan Shunde Midea Electrical Heating Appliances Manufacturing Co.,Ltd.,Foshan 528300,China)
机构地区:[1]大连理工大学,辽宁大连116024 [2]大连交通大学,辽宁大连116028 [3]佛山市顺德区美的电热电器制造有限公司,广东佛山528300
出 处:《真空》2022年第5期1-6,共6页Vacuum
基 金:国家自然科学基金(51772038,52072056);辽宁省自然科学基金博士科研启动基金计划项目(2020-BS-208);顺德区科技计划项目(201911220001)。
摘 要:非晶薄膜由于其优异的性能而被广泛研究,如不粘性和耐腐蚀性,这对于大块金属玻璃形成能力强的Zr_(55)Cu_(30)Al_(10)Ni_(5)成分来说尤为突出。本文以Zr_(55)Cu_(30)Al_(10)Ni_(5)块状金属玻璃为靶材,通过直流磁控溅射制备非晶合金薄膜,研究了不同溅射功率对薄膜力学性能、不粘性、耐蚀性和表面粗糙度的影响。结果表明,在磁控溅射功率为75~165W的范围内,可以获得高质量的非晶态薄膜,其硬度达到~9.2GPa,弹性模量~164GPa,硬弹性比~0.055,自腐蚀电流密度~1.16μA·cm^(-2),自腐蚀电位-241.27mV,最大润湿角104°。这些性能数据与文献报道的接近,硬度甚至更高,证实该薄膜具有用于不粘和抗腐蚀方面的良好潜力。Amorphous alloy films have been widely investigated because of their excellent properties such as non-stick and corrosion resistance,which are especially prominent for bulk-metallic-glass-forming Zr_(55)Cu_(30)Al_(10)Ni_(5) composition.In this work,amorphous alloy films are prepared by magnetron sputtering using Zr_(55)Cu_(30)Al_(10)Ni_(5) bulk metallic glass as the target.The effects of different sputtering power on the mechanical properties,non-stick,corrosion resistance and surface roughness of the films were studied.The results show that high-quality amorphous films,as evaluated by mechanical properties,non-stick,and corrosion resistance,can be obtained at a magnetron sputtering power range from 75W to 165W,with hardness of~9.2GPa,modulus of elasticity of~164GPa,hardness-to-elasticity ratio of~0.055,self-corrosion current density of~1.16μA·cm^(-2),self-corrosion potential of-241.27mV,and the maximum wetting angle of 104°.Such data are generally comparable with the reported ones(the hardness is even higher),confirming a good potential for non-stick and corrosion resisting purposes.
分 类 号:TG174.4[金属学及工艺—金属表面处理]
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