极紫外正入射光学系统研究进展  

Research progress of normal-incidence optical system at extreme ultraviolet(EUV) wavelength

作　　者：张哲[1] 伊圣振[1] 黄秋实[1] 陈晟昊 李文斌[1] 张众[1] 王占山[1] ZHANG Zhe;YI Shengzhen;HUANG Qiushi;CHEN Shenghao;LI Wenbin;ZHANG Zhong;WANG Zhanshan(Institute of Precision Optical Engineering,MOE Key Laboratory of Advanced Micro-Structured Materials,Shanghai Frontiers Science Center of Digital Optics,Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications,School of Physics Science and Engineering,Tongji University,Shanghai 200092,China)

机构地区：[1]同济大学物理科学与工程学院精密光学工程技术研究所,先进微结构材料教育部重点实验室,上海市数字光学前沿科学研究基地,上海市全光谱高性能光学薄膜器件与应用专业技术服务平台,上海200092

出　　处：《光学精密工程》2022年第21期2678-2687,共10页Optics and Precision Engineering

基　　金：国家重点研发计划资助项目(No.2019YFE03080200);国家自然科学基金资助项目(No.11805212)。

摘　　要：极紫外正入射光学系统广泛应用于生物结构显微成像、等离子体诊断、太阳物理观测和极紫外光刻等领域中,对其开展深入研究具有重要意义。本文对同济大学精密光学工程研究所在极紫外正入射光学系统方面的最新进展进行介绍,列举了应用于超热电子诊断、微纳成像、极紫外辐照损伤及Z箍缩等离子体诊断等不同场景中的多套正入射光学系统。这些系统分别在相应的应用中实现了优异的性能表现:毫米级视场内微米级的空间分辨;几十微米级视场内亚微米的超高空间分辨;大数值孔径下的超高能量密度极紫外辐照及多能点多通道的时空间诊断。研究所在极紫外正入射光学系统研究中取得的进展为我国等离子体诊断设备的自主可控及高端制造装备的技术储备提供了有力支持。Extreme ultraviolet(EUV) normal-incidence optical systems are widely used in biological structure microscopic imaging,plasma diagnosis,solar physical observation,and EUV lithography.Therefore,these systems warrant further study. In this paper,the latest developments of the EUV normal-incidence optical system at the Institute of Precision Optical Engineering(IPOE)of Tongji University are presented. Several normal-incidence optical systems used in different applications,such as hot electrons diagnostics,micro-nano imaging,EUV radiation induced damage,and Z-pinch plasma diagnostics are listed. These systems have achieved excellent performance in their respective applications,achieving spatial resolutions of several microns at a millimeter scale field-of-view(FOV)and realizing ultrahigh spatial resolutions on the order of sub-microns for FOVs at tens of microns scale. The systems have also realized ultrahigh-energy-density EUV radiation through a focusing system with large a numerical aperture and helped perform spatiotemporal diagnostics with multi-energy and multi-channels. The research progress of the EUV normal-incidence optical system has provided strong support for the independent and controllable research of plasma diagnostic equipment and technological reserve of advanced manufacturing equipment in China.

关 键 词：极紫外 多层膜 Schwarzschild系统 等离子体诊断 成像系统 聚焦系统 

分 类 号：TH744.1[机械工程—光学工程]