面向干式电抗器的氟碳纳米结构薄膜性能调控方法研究  

Research on Performance Controlling Method of Fluorocarbon Nanostructured Film for Dry Reactors

作　　者：赵琦 满玉岩[3] 李苏雅[1,2] 李松原 李琳[1,2] ZHAO Qi;MAN Yu-yan;LI Su-ya;LI Song-yuan;LI Lin(State Grid Tianjin Electric Power Research Institute,Tianjin 300384,China;Tianjin Key Laboratory of Internet of Things in Electricity,Tianjin 300384,China;State Grid Tianjin Electric Power Company,Tianjin 300010,China)

机构地区：[1]国网天津市电力公司电力科学研究院,天津300384 [2]天津市电力物联网企业重点实验室,天津300384 [3]国网天津市电力公司,天津300010

出　　处：《真空》2022年第6期51-55,共5页Vacuum

基　　金：国网天津市电力公司科技项目(KJ22-1-36)。

摘　　要：氟碳薄膜具有低介电常数和摩擦系数、高热稳定性和化学惰性、强紫外吸收等优点,作为表面修饰材料,有望提升干式电抗器运行时的环境耐候性和绝缘稳定性。以磁控溅射技术制备氟碳薄膜具有杂质粒子污染少、沉积面积大、反应物成本低、无环境污染等优点。溅射过程中等离子体状态是影响薄膜质量的关键因素,本文讨论了真空室温度和基底温度协同作用对氟碳薄膜化学组分、微结构、沉积速率和微观形貌的影响。结果表明:温度直接作用于溅射组分的产生、输运和沉积过程;温度升高使薄膜表面呈现颗粒-团簇-三维网状结构的形貌演化规律;随溅射温度增加,沉积速率、粗糙度、氟碳比和sp^(3)杂化碳占比增大,薄膜朝类聚四氟乙烯(PTFE-like)的方向发展,有望获得更优异的理化特性。Fluorocarbon(FC) film exhibits characteristics of low dielectric constant and friction coefficient, high thermal stability and chemical inertness, strong ultraviolet absorption, etc. As a surface modification material, it is expected to improve environmental weatherability and insulation stability of dry reactors during operation. Research on FC film preparation by sputtering has the advantages of less contamination by impurity particles, large deposition area, low cost of reactants, and no environmental pollution. The plasma state during sputtering is a key factor affecting the quality of FC film. This paper discusses the synergistic effects of vacuum chamber temperature and substrate temperature on the chemical composition, microstructure, deposition rate and micromorphology of FC film. The results show that the temperature directly influence generation, transportation and deposition of sputtering components. The increment of temperature results in morphology evolution law of particle-cluster-three-dimensional network structure. Deposition rate, roughness, fluorine to carbon ratio and the proportion of sp^(3) hybrid carbon increase with the sputtering temperature. Therefore, FC film develops in the direction of PTFE-like film, which is expected to exhibit more excellent physio-chemical properties.

关 键 词：氟碳薄膜 磁控溅射 微纳结构 理化特性 

分 类 号：O484[理学—固体物理] TM47[理学—物理]