二氧化钛表面接触电位差测试设计与分析  

Design and analysis of contact potential difference measurementon titanium dioxide surface

作　　者：穆磊磊 王康谊[1] MU Leilei;WANG Kangyi(School of Information and Communication Engineering,North University of China,Taiyuan 030051,China)

机构地区：[1]中北大学信息与通信工程学院,山西太原030051

出　　处：《传感器与微系统》2023年第1期34-37,42,共5页Transducer and Microsystem Technologies

摘　　要：作为光催化剂模型材料的金红石型二氧化钛(110)结构,同时针对金红石型二氧化钛(110)提出了接触电位差(CPD)的2种测试方法,包括二次扫描法与原子追踪2D测试法。基于超高真空超低温调频原子力显微镜与开尔文探针力显微镜(UHV-ULT-NC-AFM/KPFM)测试技术,通过对探针的修饰,完成了金红石型二氧化钛(110)表面CPD的表征。实验发现由于Smoluchowski效应,二氧化钛(110)表面台阶上CPD可减少0.2 V,同时研究了CPD减少与光催化活性的关系。为后期相关研究实验奠定了基础。The structure of rutile titanium dioxide(110)is used as a photocatalyst model material,and aiming at rutile titanium dioxide(110),two testing methods for the contact potential difference(CPD)are proposed including double scanning method and atomic tracking 2D method.Based on ultrahigh vacuum ultralow temperature FM atomic force microscope and Kelvin probe force microscope(UHV-ULT-NC-AFM/KPFM)testing technology,the surface CPD characterization of rutile titanium dioxide(110)is completed by modifying the probe.It is found that due to Smoluchowski effect,the CPD on the surface step of titanium dioxide(110)can be reduced by 0.2 V.The relationship between the reduction of CPD and the photocatalytic activity is also studied.A foundation is laid for the later relevant research experiments.

关 键 词：光催化剂 接触电位差 超高真空 调频原子力显微镜 开尔文探针力显微镜 

分 类 号：TH741[机械工程—光学工程]