基于刻蚀反应的纳米结构空心化  

Etching-based Hollowing of Nanostructures

作　　者：叶祖洋 殷亚东 YE Zuyang;YIN Yadong(Department of Chemistry,University of California,Riverside,California 92521,the United States)

机构地区：[1]加州大学河滨分校化学系,美国加利福尼亚92521

出　　处：《高等学校化学学报》2023年第1期1-12,共12页Chemical Journal of Chinese Universities

基　　金：美国国家科学基金(批准号:DMR-1810485)资助.

摘　　要：中空纳米材料的可控合成使其在催化、能量转换与储存、生物医药等领域具有广阔的应用前景.本专论旨在揭示刻蚀反应对纳米结构空心过程的关键影响.讨论了通过增强纳米粒子表面在刻蚀液中的相对稳定性来精确操纵中空化过程的策略,主要关注3种刻蚀策略,包括硬模板法、氧化还原辅助中空法和表面钝化自模板法.最后,对基于刻蚀反应的纳米结构空心化可控合成未来的发展方向进行了展望.The controllable synthesis of hollow nanomaterials has broad application prospects in many fields,such as catalysis,energy conversion and storage,and biomedicine. This account aims to reveal the key effects of etching on the hollowing process of nanostructures. We discuss the precise manipulation of the hollowing process by enhancing the relative stability of the nanoparticle surface in the etchant,mainly focusing on three types of etching strategies,including the hard templating method,redox-assisted etching method,and surface-passivated etching method. Finally,we provide an outlook on the future development of etching-based strategies for the controllable synthesis of hollow nanostructures.

关 键 词：中空结构 刻蚀 模板 自模板法 纳米合成 表面钝化 

分 类 号：O648[理学—物理化学]