18K金表面磁控溅射铑薄膜的颜色  

Color of rhodium film deposited on 18K gold surface by magnetron sputtering

作　　者：植宝 袁军平[1] 袁佩 曾慧妍 胡博文 ZHI Bao;YUAN Junping;YUAN Pei;ZENG Huiyan;HU Bowen(Jewelry Institute of Guangzhou Panyu Polytechnic,Guangzhou 511483,China)

机构地区：[1]广州番禺职业技术学院珠宝学院,广东广州511483

出　　处：《电镀与涂饰》2023年第3期27-34,共8页Electroplating & Finishing

基　　金：教育部高等职业教育创新发展行动计划项目(教职成函[2019]10号);2022年广州市教育局高校科研项目(202235327)。

摘　　要：首饰表面常通过电镀铑来改善颜色和耐蚀性,但是多数电镀工艺存在较严重的环境污染问题。采用真空磁控溅射工艺在18K金试片及试盒表面沉积铑薄膜,并采用分光光度计检测了不同工艺条件下所得铑薄膜的颜色及其分布均匀性。结果表明,镀膜时间、靶电流、镀膜室温度、本底真空度、镀件结构和悬挂方式都对铑薄膜颜色及均匀性有不同程度的影响。在合适的工艺条件下对18K金表面磁控溅射所得铑薄膜与电镀铑薄膜的颜色非常接近,可以满足现有镀铑膜颜色的需求。Rhodium electroplating is a technology commonly applied to improve the color and corrosion resistance of jewelry, but most of the electroplating processes have serious pollution problems. A rhodium film was deposited on the surface of 18K gold specimen and test box by magnetron sputtering in vacuum. The color and distribution uniformity of rhodium films deposited under different conditions were detected by spectrophotometry. The results showed that the process parameters, i.e. deposition time, current applied to target, temperature of chamber, base pressure, structure of workpiece, and hanging mode, have different impacts on the color and uniformity of magnetron-sputtered rhodium film. Under appropriate process conditions, the color of rhodium film deposited by magnetron sputtering on 18K gold substrate is very close to that of the electroplated one, meeting the current specification of rhodium film.

关 键 词：金合金 磁控溅射 铑 颜色 均匀性 

分 类 号：TQ153.19[化学工程—电化学工业]