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作 者:杨岭 潘应君[1] 郑世恩 朱星宇 Yang Ling;Pan Yingjun;Zheng Shien;Zhu Xingyu(College of Materials and Metallurgy,Wuhan University of Science and Technology,Wuhan 430081,China)
机构地区:[1]武汉科技大学材料与冶金学院,湖北武汉430081
出 处:《电镀与精饰》2023年第3期11-17,共7页Plating & Finishing
基 金:武汉科技大学省部共建耐火材料与冶金国家重点实验室青年资金(2018QN04)和武汉科技大学钢铁冶金及资源利用省部共建教育部重点实验室开放基金(FMRUlab17-7)。
摘 要:为解决石墨表面制备的不粘涂层结合力低的问题,可采用钛薄膜作为过渡层以提高结合力。本文采用磁控溅射技术在石墨基片表面制备钛薄膜,通过优化溅射工艺参数,提高钛薄膜的附着力。通过正交试验设计研究溅射功率、溅射气压和沉积时间对钛薄膜组织结构、表面粗糙度以及附着力的影响。利用扫描电镜(SEM)等分析了钛薄膜的微观形貌、物相结构及表面粗糙度,进行划格试验评估了薄膜的附着力。研究得到优化工艺参数为:溅射功率200 W,溅射气压1.2 Pa,沉积时间50 min。薄膜微观呈现岛状结构,颗粒尺寸约150 nm。钛薄膜为密排六方α-Ti结构,沿(002)晶面择优生长,这可能与石墨基体的片层状结构有关。溅射工艺参数的优化可以有效提高钛薄膜与石墨基体的附着力。In order to solve the problem of low binding force of non-stick coating prepared on graphite surface, titanium film can be used as transition layer to improve the binding force. Titanium films were prepared on graphite substrate by magnetron sputtering. The adhesion of titanium films was improved by optimizing sputtering process parameters. The effects of sputtering power, sputtering pressure and deposition time on microstructure, surface roughness and adhesion of Ti films were investigated by orthogonal experiment. The microstructure, phase structure and surface roughness of Ti films were analyzed by different methods such as SEM, and the adhesion of Ti films was evaluated by lattice test.The optimized process parameters are as follows: sputtering power 200 W, sputtering pressure 1.2 Pa, deposition time 50 min. The microstructure of the film presents an island structure, and the particle size is about 150 nm. The titanium films have a dense hexagonal α-Ti structure and grow along the(002) crystal plane preferentially, which may be related to the lamellar structure of the graphite matrix. The optimization of sputtering process parameters can effectively improve the adhesion between titanium film and graphite matrix.
关 键 词:磁控溅射 钛薄膜 石墨 工艺参数 附着力 粗糙度
分 类 号:TG174.444[金属学及工艺—金属表面处理]
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