大面阵锑化铟探测器芯片背减薄工艺技术开发  

Development of Back Thinning Technology for Large-Area Array InSb Detector Chip

作　　者：李海燕 曹凌霞 陈籽先 黄婷 程雨 LI Hai-yan;CAO Ling-xia;CHEN Zi-xian;HUANG Ting;CHEN Yu(The 11th Research Institute of China Electronics Technology Group Corporation,Beijing 100015,China)

机构地区：[1]中国电子科技集团有限公司第十一研究所,北京100015

出　　处：《红外》2023年第2期8-12,共5页Infrared

基　　金：陆军装备军内科研项目(20212C031781);河北省军民科技协同创新专项(20355601D)。

摘　　要：为实现大尺寸锑化铟混成芯片的高质量、高成品率背减薄,介绍了一种单点金刚石车削与磨抛相结合的背减薄工艺。该工艺采用单点金刚石车削技术实现锑化铟芯片大量厚度去除,然后通过旋转磨削工艺进一步去除车削损伤,最终实现了1280×10^(24)元(25μm)大尺寸锑化铟混成芯片背减薄(材料表面的半峰宽值约为8.20~11.90 arcsec)。与传统磨削工艺相比,该工艺对尺寸大、面型差的半导体芯片兼容性强,解决了大尺寸芯片在传统磨削工艺中因面型带来的裂片率高、减薄厚度不均匀的问题。In order to realize the high quality and high yield back thinning of large size InSb hybrid chips,a single-point diamond turning technology combined with grinding and polishing process is introduced.This process uses single-point diamond turning technology to remove a large amount of thickness of InSb chip,and on this basis,further remove the turning damage through rotary grinding process.Finally the back of 1280×10^(24)(25μm)large-size InSb hybrid chip is thinned.The half-peak width of the material surface is about 8.20--11.90 arcsec.Compared with the traditional grinding process,this process has strong compatibility with semiconductor chips with large size and poor surface shape,and solves the problems of high crack rate and uneven thinning thickness caused by surface shape problems of large size chips in the traditional grinding process.

关 键 词：锑化铟 单点金刚石车削 背减薄 

分 类 号：TN215[电子电信—物理电子学]