磁控溅射沉积银薄膜/涂层的研究进展  

Research Progress of Silver Films/Coatings Deposited by Magnetron Sputtering

作　　者：宁哲达 王一晴[1] 陈天天 谭志龙[1] 闻明[1] Ning Zheda;Wang Yiqing;Chen Tiantian;Tan Zhilong;Wen Ming(State Key Laboratory of Advanced Technologies for Comprehensive Utilization of Platinum Metals,Kunming Institute of Precious Metals,Kunming 650106,China)

机构地区：[1]昆明贵金属研究所稀贵金属综合利用新技术国家重点实验室,云南昆明650106

出　　处：《稀有金属材料与工程》2022年第12期4773-4782,共10页Rare Metal Materials and Engineering

基　　金：云南省国际合作计划项目(2014IA037);云南省创新团队项目(2019HC024);云南省科技厅科研院所技术开发研究专项(2018DC004)。

摘　　要：银薄膜/涂层是一种在高新技术领域极具潜力的新材料,近年来在现代工业中得到了广泛的应用。采用磁控溅射制备的银薄膜/涂层具有优异的附着力,通过选择相应的沉积参数可以实现对银薄膜/涂层微观结构及性能的调控。本文综述了磁控溅射沉积银薄膜/涂层的主要制备工艺,评述了银薄膜/涂层在其主要应用领域内的研究进展,并对其未来的发展进行了展望。Silver films/coatings are new materials with great potential in the field of high and new technology, and have been extensively used in modern industry in recent years. The silver thin films/coatings prepared by magnetron sputtering have excellent adhesion with substrate. The microstructure and properties adjustment of silver thin films/coatings can be achieved by selecting appropriate deposition parameters. In this paper,the main preparation methods of silver thin films/coatings deposited by magnetron sputtering were summarized. The research progress of silver thin films/coatings in its main application fields was reviewed, and the future development of silver thin films was prospected.

关 键 词：磁控溅射 银薄膜/涂层 显微结构 应用 

分 类 号：TG174.444[金属学及工艺—金属表面处理]