劳埃德式紫外激光干涉光刻实验  

UV-laser interference lithography experiment based on Lloyd mirror

作　　者：钟晓岚 宋佳奇 李晓苗 姚旭 严琪琪[1] 金硕[1] ZHONG Xiaolan;SONG Jiaqi;LI Xiaomiao;YAO Xu;YAN Qiqi;JIN Shuo(School of Physics,Beihang University,Beijing 100191,China)

机构地区：[1]北京航空航天大学物理学院,北京100191

出　　处：《物理实验》2023年第3期22-28,共7页Physics Experimentation

基　　金：北京航空航天大学研究生教育与发展研究专项基金资助(No.JG2022017);北京高校本科教学改革创新项目资助(No.202210006003)。

摘　　要：搭建了劳埃德式紫外激光干涉光刻系统,利用劳埃德镜产生双光束分波阵面干涉,通过精确调整、控制光束的入射角,设计了曝光图样.基础实验部分可以完成一维光栅制备,分析光栅周期与波长、入射角的关系;在拓展实验中,制备设计部分可以完成二维点阵或准晶结构制备,前沿拓展部分可以制备表面等离极化激元微腔.基于劳埃德式激光干涉光刻实验操作便捷、展示度高,同时涵盖光干涉原理的介绍和光路调整、样品制备和表征等实验内容,有助于学生掌握激光干涉光刻的实验技能.The UV-laser interference lithography system was built.The Lloyd mirror was used to generate two-beam wave-front division interference,and the exposure patterns were designed by accurately adjusting and controlling the incident angle of the beam.In the basic experiment,one-dimensional grating could be prepared,and the dependence of grating period on wavelength and incidence angle could be analyzed.In the extended experiment,the preparation of two-dimensional lattice or quasicrystal structure could be completed as the design content,and the surface plasmon polariton microcavity could be prepared as the frontier extension content.UV-laser interference lithography experiment based on Lloyd mirror was convenient to operate and had the good performance of display.It also covered the introduction of optical interference principle and optical path adjustment,the sample preparation and characterization experiments.The comprehensive experiment was helpful for students to master the experimental skills on laser interference lithography.

关 键 词：劳埃德镜 紫外激光干涉 激光光刻 微纳米技术 

分 类 号：TN305.7[电子电信—物理电子学] O436.1[机械工程—光学工程]