四氟化碳中三氟化氮杂质的热分解技术研究  

Research on Thermal Decomposition Technology of Nitrogen Trifl uoride Impurity in Carbon Tetrafl uoride

作　　者：林德荣 Lin Derong(Fujian Deer Technology Co.,Ltd.,Fujian,364204)

机构地区：[1]福建德尔科技股份有限公司,福建364204

出　　处：《当代化工研究》2023年第5期182-184,共3页Modern Chemical Research

摘　　要：在集成电路制造中,四氟化碳(CF_(4))气体常用作硅片干法蚀刻和清洗剂,而被广泛用于微电子、太阳能、电池、火箭等领域。采用氟碳直接合成法制备四氟化碳时,三氟化氮等杂质的产生不可避免,并且这些强氧化剂又会影响四氟化碳的使用,所以去除氧化性杂质一直都是工业上不可避免的问题,因此,研究四氟化碳的提纯对工业应用有着重要的意义。为了将四氟化碳提纯到99.9995%以上的电子级水平,必须将四氟化碳中的三氟化氮杂质控制在1ppmv以下。本文利用四氟化碳与三氟化的分解温度相差较大的特点,设计开发了五塔串联中频热解装置以去除三氟化氮,并通过试验对热解工艺条件进行优化,取得了良好的效果。In integrated circuit manufacturing,carbon tetrafluoride(CF_(4))gas is commonly used as silicon wafer dry etching and cleaning agent,and is widely used in microelectronics,solar energy,batteries,rockets and other fields.When carbon tetrafluoride is prepared by direct synthe-sis of fluorocarbon,the production of impurities such as nitrogen trifluoride is inevitable,and these strong oxidants will affect the use of carbon tetra-fluoride,so the removal of oxidizing impurities has always been an inevitable problem in industry.Therefore,it is of great significance to study the pu-rification of carbon tetrafluorides for industrial application.In order to purify carbon tetrafluoride to the electronic level above 99.9995%,the nitrogen trifluoride impurity in carbon tetrafluoride must be controlled below 1 ppmv.Taking advantage of the large difference in decomposition temperature between carbon tetrafluoride and nitrogen trifluoride,this paper designed and developed a five-tower series intermediate frequency pyrolysis device to remove nitrogen trifluoride,and optimized the pyrolysis process conditions through experiments,and obtained good results.

关 键 词：四氟化碳 三氟化氮 杂质 高温热解 热解工艺 

分 类 号：TQ124.3[化学工程—无机化工]