微米级双层复合结构的一步光刻制备技术  

One-Step Photolithographic Preparation Technology of Micron-Level Double-Layer Composite Structures

作　　者：张登英 朱林伟 李伟任 高鸿鹄 邢文强 姜潇桐 王军 徐征[1,4] Zhang Dengying;Zhu Linwei;Li Weiren;Gao Honghu;Xing Wenqiang;Jiang Xiaotong;Wang Jun;Xu Zheng(Institute of Optoelectronics Technology,Beijing Jiaotong University,Beijing 100044,China;Beijing Solar Power Research Institute Co.,Ltd.,Beijing 101102,China;School of Physics and Optoelectronic Engineering,Ludong University,Yantai 264025,Shandong,China;Key Laboratory of Luminescence and Optical Information,Ministry of Education,Beijing Jiaotong University,Beijing 100044,China)

机构地区：[1]北京交通大学光电子技术研究所,北京100044 [2]北京太阳能电力研究院有限公司,北京101102 [3]鲁东大学物理与光电工程学院,山东烟台264025 [4]北京交通大学发光与光信息技术教育部重点实验室,北京100044

出　　处：《光学学报》2023年第3期204-210,共7页Acta Optica Sinica

基　　金：国家自然科学基金(61705096,62174073);中国博士后基金(2018M631385)。

摘　　要：设计了两种具有不同参数的光刻掩模版,利用光刻技术制备了两种微米级双层复合结构。研究了曝光能量对凹形缺口深度的影响,同时采用有限差分时域法分析了掩模版曝光时的光场分布情况,阐明了微米级双层复合结构形成的物理机理。实验结果表明:通过调整曝光能量的大小,能够有效地控制凹形缺口的深度。对8μm厚的AZ9260光刻胶来说,不高于160 mJ/cm^(2)的曝光能量是制备出微米级双层复合结构的关键。该技术在制备微米尺寸的分层器件方面有着潜在的应用前景。Objective In bionics research,micronlevel doublelayer composite structures can usually show better mechanical,optical,and chemical properties than singlelayer structures.Designing and constructing these unique biomimetic microstructure surfaces for human use is a hot research topic in recent years.The traditional photolithography technology is very convenient and has the advantage of simple process when it is applied to prepare the micronlevel singlelayer structures.However,when the traditional photolithography technology is adopted to prepare the micronlevel doublelayer composite structures,it needs to use the overlay lithography process for many times,which will greatly increase the manufacturing difficulty and processing cost of the microstructure.To overcome the above difficulties,researchers have developed a variety of microstructure processing methods,such as dry/wet etching,nanoimprinting,3D printing,selfassembly,laser processing,photolithography,replication molding,and electrospinning.A variety of singlelayer microstructure surfaces can be prepared by using these technology combinations,and even multiscale micronlevel composite structure surfaces can be prepared.However,the combinations often lead to more cumbersome processing procedures and higher costs of micronlevel composite structures.To solve these problems,a method to adjust the exposure efficiency of photoresist by changing the width of the light transmitting part on the mask is proposed.By this method,the micronlevel doublelayer composite structures can be obtained on the positive photoresist with only one exposure and one development,which greatly reduces the processing difficulty and manufacturing costs of such structures and provides a new strategy for fabricating multiscale micronlevel composite structures.Methods Two lithographic masks with different parameters are designed and purchased from the 55th Research Institute of China Electronics Technology Group Corporation.The pattern of the mask and the schematic diagram of the photolithography

关 键 词：光学器件 微结构制造 光刻 微米级双层复合结构 有限差分时域法 

分 类 号：O436[机械工程—光学工程]