电子特气在低温干法刻蚀中的应用与发展  

Application and Development of Electronic Specialty Gases in Cryogenic Dry Etching

作　　者：陈润泽 花莹曦 张建伟 倪珊珊 吝秀锋 李欣 孙加其 王佳佳 CHEN Runze;HUA Yingxi;ZHANG Jianwei;NI Shanshan;LIN Xiufeng;LI Xin;SUN Jiaqi;WANG Jiajia(PERIC Special Gases Co.,Ltd.,Handan 056107,China)

机构地区：[1]中船(邯郸)派瑞特种气体股份有限公司,河北邯郸056107

出　　处：《低温与特气》2023年第2期11-16,共6页Low Temperature and Specialty Gases

摘　　要：介绍了低温干法刻蚀技术的技术原理、应用和进展,探讨了不同刻蚀气体和工艺参数对低温干法刻蚀工艺的影响。The technical principle,application and technical progress of cryogenic dry etching technology has been introduced,and the influence of different etching gases and process parameters on cryogenic dry etching process is discussed.

关 键 词：低温干法刻蚀 反应离子刻蚀 电子特气 

分 类 号：TN305.7[电子电信—物理电子学] TN405.982