基于光栅制造的光刻投影物镜设计  

Design of Lithographic Projection Lens Based on Grating Fabrication

作　　者：任东旭[1] 班楠楠 孔明旭 李彬[1] Ren Dongxu;Ban Nannan;Kong Mingxu;Li Bin

机构地区：[1]中原工学院机电学院

出　　处：《工具技术》2023年第5期141-144,共4页Tool Engineering

基　　金：国家自然科学基金(51905558,51975599)。

摘　　要：光栅尺作为位移传感器被广泛应用在精密测量体系中,随着测量趋于纳米级精度和大量程,对光栅尺的制造精度提出了更高的要求。刻线误差是影响光栅尺制造精度的重要因素,减小刻线误差能够有效提高光栅制造精度。设计了一种大孔径、低畸变的投影光刻物镜,并在Zemax光学设计软件中对物镜进行了设计及优化。结果显示,其全视场波像差小于λ/10,MTF>0.6,最大畸变<0.0037%,最大分辨率R=2μm,数值孔径NA=0.15,缩小倍率5×,最大焦深±9.73μm。对其进行公差分析,结果表明,该物镜完全满足提高光栅尺制造精度的需求。In the precision measurement system,grating ruler is widely used as displacement sensor.With the measurement accuracy tending to nanometer level and large range,higher requirements are put forward for the manufacturing accuracy of grating ruler.The engraving error is an important factor affecting the manufacturing accuracy of grating ruler.Reducing the engraving error can effectively improve the manufacturing accuracy of grating.Based on this,a large aperture and low distortion projection lithography objective is designed.The objective is designed and optimized in zemax optical design software.The results show that the whole market wavefront aberration is less than λ/10,MTF>0.6,maximum distortion<0.0037%,maximum resolution R=2μm,numerical aperture NA=0.15,reduction ratio is 5×,maximum focal depth is+9.73μm.Then the tolerance analysis is carried out.The results show that the objective fully meets the requirements of improving the manufacturing accuracy of grating ruler.

关 键 词：刻线误差 投影光刻物镜 光学设计 光栅制造 

分 类 号：TG806[金属学及工艺—公差测量技术] TH74[机械工程—光学工程]