Nb/Al-AlO_(x)/Nb约瑟夫森结薄膜沉积研究  

Study of the Deposition of Nb/Al-AlO_(x)/Nb Josephson Junction Trilayer

作　　者：高鹤 王仕建 徐达 李劲劲[1] 王雪深[1] 钟青[1] GAO He;WANG Shi-jian;XU Da;LI Jin-jin;WANG Xue-shen;ZHONG Qing(Center for Advanced Measurement Science,National Institute of Metrology,Beijing 102200,China)

机构地区：[1]中国计量科学研究院前沿计量科学研究中心,北京102200

出　　处：《计量学报》2023年第5期765-770,共6页Acta Metrologica Sinica

基　　金：中国计量科学研究院基本科研业务(AKY1946,AKYZD2012,AKYZZ2124)。

摘　　要：Nb/Al-AlO x/Nb约瑟夫森结构成的低温超导器件有着广泛应用,高质量的S-I-S约瑟夫森结制备的关键之一在于制备高质量的三层膜。三层膜的质量可由许多属性参数影响,比如剩余电阻比R.R.R、超导转变温度T c、表面粗糙度、应力、铝膜厚度等等。通过对薄膜的溅射沉积条件与上述参数进行分析研究,确定最佳的生长条件。调节不同的氧化工艺条件,可以获得约瑟夫森结的不同临界电流密度。Low temperature superconducting devices based on Nb/Al-AlO x/Nb Josephson junctions are widely used,one of the keys to fabricate high-quality S-I-S Josephson junctions is to deposit high-quality Nb/Al-AlO x/Nb trilayer.Many property parameters can influence the quality of trilayer,such as the residual resistance ratio(R.R.R),superconducting transition temperature(T c),surface roughness,film stress,the thickness of aluminum(Al)film and so on.By analyzing the relationships of the parameters above with different sputtering conditions,the best deposition condition can be determined.Also,different critical current densities of Nb/Al-AlO x/Nb trilayer can be obtained by controlling the oxidation pressure and time of Al.

关 键 词：计量学 约瑟夫森结 Nb/Al-AlO_(x)/Nb三层薄膜沉积 直流磁控溅射 氧化工艺 

分 类 号：TB971[一般工业技术—计量学]