光刻物镜波像差绝对检测技术综述  

Review of absolute measurement of wavefront aberration in lithography objective

作　　者：王青蓝 全海洋[1] 胡松[1] 刘俊伯[1] 侯溪[1] Wang Qinglan;Quan Haiyang;Hu Song;Liu Junbo;Hou Xi(Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu,Sichuan 610209,China;University of Chinese Academy of Sciences,Beijing 100049,China)

机构地区：[1]中国科学院光电技术研究所,四川成都610209 [2]中国科学院大学,北京100049

出　　处：《光电工程》2023年第5期36-59,共24页Opto-Electronic Engineering

摘　　要：光刻物镜是光刻机核心部件,其波像差大小决定着光刻机的分辨率和套刻精度。随着光刻机性能的逐步提升,光刻物镜波像差要求已经降低到0.5nm(RMS)以下,这对波像差的检测是一个极大的挑战。现行的光刻物镜波像差检测方法(如哈特曼法,剪切干涉法和点衍射法等)的检测精度往往受限于其系统误差,而绝对检测技术是一种能够将系统误差分离出来的技术,最终突破精度极限。本文回顾了光刻物镜系统波像差检测方法和波前绝对检测技术,详细梳理了绝对检测技术在不同波像差检测方法中的应用和研究进展,重点总结了绝对检测技术在不同波像差检测方法中的技术难点,同时结合这些难点,展望了光刻物镜波像差绝对检测技术的未来发展趋势。The lithography objective is the core component of the lithography machine,and its wave aberration determines the resolution and overlay accuracy of the lithography machine.With the gradual improvement of the performance of the lithography machine,the wave aberration requirement of the lithography objective lens has been reduced to below 0.5 nm(RMS),which is a great challenge to the detection of the wave aberration.The detection accuracy of current lithography objective wave aberration detection methods(such as Hartmann method,shear interference method and point diffraction method,etc.)is often limited by its systematic error,and absolute detection technology is a method that can separate the systematic error.The technology that came out finally broke the limit of precision.This paper reviews the wave aberration detection method and surface absolute detection technology of lithography objective lens system,combs the application and research progress of absolute detection technology in wave aberration detection in detail,and summarizes the application of absolute detection technology in different wave aberration detection methods.At the same time,combined with these difficulties,the future development trend of the absolute detection technology of wave aberration of lithography objective lens is prospected.

关 键 词：光刻物镜系统 光学检测 波像差 绝对检测 

分 类 号：TH743[机械工程—光学工程]