原子层沉积与聚焦离子束切片法制备X射线波带片  

Preparation of X-Ray Fresnel Zone Plate by Atomic Layer Deposition and Focused Ion Beam Slicing

作　　者：谭明生 明帅强 吴雨菲 卢维尔[1,3] 李艳丽 孔祥东[2,3] 刘海岗[4] 夏洋 韩立 Tan Mingsheng;Ming Shuaiqiang;Wu Yufei;Lu Weier;Li Yanli;Kong Xiangdong;Liu Haigang;Xia Yang;Han Li(Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029,China;Institute of Electrical Engineering,Chinese Academy of Sciences,Beijing 100190,China;University of Chinese Academy of Sciences,Beijing 100049,China;Shanghai Synchrotron Radiation Facility,Shanghai Advanced Research Institute,Chinese Academy of Sciences,Shanghai 201800,China)

机构地区：[1]中国科学院微电子研究所,北京100029 [2]中国科学院电工研究所,北京100190 [3]中国科学院大学,北京100049 [4]中国科学院上海高等研究院上海同步辐射光源,上海201800

出　　处：《光学学报》2023年第11期300-308,共9页Acta Optica Sinica

基　　金：中国科学院团队项目(GJJSTD20200003);中国科学院电工研究所基金项目(E1554404);自然科学基金项目(12104454)。

摘　　要：针对X射线波带片对大高宽比的应用需求,采用原子层沉积法在光滑的金属丝表面生长膜厚可高精度控制的多层膜环带结构,再利用聚焦离子束切片技术获得大高宽比的多层膜X射线波带片。采用复振幅叠加法设计了以Al2O3/HfO2分别为明环和暗环材料的X射线波带片,实验上利用原子层沉积在直径为72μm的金丝表面交替沉积了10.11μm的Al2O3/HfO2多层膜,环带数为356,总直径为92.22μm,最外环宽度为25 nm。通过聚焦离子束切割得到高为1.08μm、高宽比达43∶1的X射线多层膜菲涅耳波带片。该波带片应用于上海光源(BL08U1A)软X射线成像线站时,在1.2 keV X射线下实现聚焦成像功能,展现出利用该技术制备多层膜X射线波带片的潜力。Objective Fresnel zone plate(FZP)is one of the most important components in Xray microscopic imaging systems,which can realize highefficiency and highresolution threedimensional(3D)nondestructive imaging by diffraction principle.It is considered as one of the most potential devices to improve the quality of Xray microscopic imaging and has been widely used in metal flaw detection,cell imaging,material testing,and other fields.High Xray microscopic imaging quality means the high imaging resolution and diffraction efficiency wihch expects Xray FZP with a large aspect ratio,that is,small outermost zone width and large thickness.The conventional fabrication technique of Xray FZP is based on the most accurate lithography technique,namely ebeam lithography(EBL).However,the combination of large FZP thickness and small outermost zone width is usually out of the limits of EBL.Multilayer FZP(MLFZP)is a promising solution to fabricate highaspectratio FZP due to the unique sputtersliced technique.Especially,the technique of atomic layer deposition(ALD)and focused ion beam(FIB)has emerged as an attractive combination to fabricate MLFZP.Due to selflimiting surface reaction,ALD can realize atomicscale precision in layer thickness and excellent conformality on the cylindrical substrate and is capable of coating many substrates simultaneously.The slicing and polishing processes both can be completed with FIB equipment.In order to meet the demand of a large aspect ratio of the zone plate for Xray application,in this paper,multilayer films with high precision control of thickness were grown on a smooth surface of metal wire by ALD,and then MLFZP with a large aspect ratio was obtained by FIB slicing.Methods First,The Xray MLFZP with Al_(2)O_(3)/HfO_(2) as bright and dark ring materials was designed by the complex amplitude superposition method.Then,Al_(2)O_(3)/HfO_(2) multilayer films were alternately deposited on the surface of gold wire with a diameter of 72μm by ALD.The layers were grown in a doublecavity rapid ALD equipment at

关 键 词：X射线菲涅耳波带片 原子层沉积 聚焦离子束 大高宽比 多层膜 

分 类 号：O436[机械工程—光学工程]