圆筒式磁控溅射靶的磁场仿真与结构设计  

Magnetic Field Simulation and Structure Design of Cylindrical Magnetron Sputtering Target

作　　者：王栋 蔡长龙[1] 弥谦[1] 王麟博 刘桦辰 侯杰 WANG Dong;CAI Chang-long;MI Qian;WANG Lin-bo;LIU Hua-chen;HOU Jie(College of Ordnance Science and Technology,Xi'an Technological University,Xi'an 710021,China)

机构地区：[1]西安工业大学兵器科学与技术学院,西安710021

出　　处：《表面技术》2023年第8期371-379,共9页Surface Technology

基　　金：国家自然科学基金(11975177);西安市智能探视感知重点实验室资助项目(201805061ZD12CG45);西安市智能兵器重点实验室资助项目(2019220514SYS020CG042)。

摘　　要：目的探究一种可用于实现圆柱形工件外表面镀膜设备的可能性,设计了一种新型的圆筒式磁控溅射靶结构,溅射在圆筒状靶材内表面发生,从整个圆周方向对工件外表面镀膜,以改善传统长管工件镀膜设备体积庞大、结构复杂的不足。方法首先对圆筒式磁控溅射靶进行初始结构设计,再运用有限元分析软件COMSOL中静磁无电流仿真模块,通过控制变量法对溅射靶内部冷却背板厚度d1、内磁环轴向高度h1、内磁环径向宽度Δr1、外磁环轴向高度h2、外磁环径向宽度Δr2以及内外磁环间距d2不同结构参数下的靶面水平磁感应强度值进行仿真与研究。在此基础上进行磁场优化并设计出溅射靶的理想磁铁结构参数。结果计算结果表明,当冷却背板厚度为13 mm,外磁环内径为266 mm、外径为310 mm、厚度为20 mm,内磁环内径为270 mm、外径为310 mm、厚度为22 mm,内外磁环间距为50 mm时,距靶面上方3 mm处最大水平磁感应强度为40 mT,磁场分布均匀区域可达40%左右。结论此外考虑溅射靶内部的水冷、密封以及绝缘结构,最终设计的圆筒式磁控溅射靶整体高384 mm,最大直径432 mm,结构紧凑可靠,为长管工件外表面金属薄膜的制备提出了一种新的磁控溅射靶结构。In order to explore the possibility of a device which can be used to coat the outer surface of cylindrical workpiece,a new type of cylindrical magnetron sputtering target is designed.Sputtering takes place on the inner surface of the cylindrical target,and the outer surface of the workpiece is coated from all sides to improve the large volume and complex structure of the traditional coating device for long tube workpiece.Firstly,the initial structure of the cylindrical magnetron sputtering target was designed,and then the magnetostatic non-current simulation module in the finite element analysis software COMSOL was used and the horizontal magnetic induction of the target with different structure parameters,such as the thickness of the inner cooling backplane d1,the axial height h1 of the inner magnetic ring,the radial widthΔr1 of the inner magnetic ring,the axial height h2 of the outer magnetic ring,the radial widthΔr2 of the outer magnetic ring,and the distance between the inner and outer magnetic rings d2,was simulated and studied by the control variable approach.It was found that with the increase of the thickness of the cooling back plate,the distance between the inner magnetic ring and the outer magnetic ring,the radial width of the internal magnetic ring,the external magnetic ring and the entire magnetic steel,the horizontal magnetic induction of the target would decrease.The uniformity of magnetic field distribution could be improved by increasing the axial height of outer magnetic ring and the distance between inner and outer magnetic ring.The increase of the axial height and the radial width of the outer magnetic ring made the uniformity worse.On this basis,the magnetic field was optimized and the ideal magnet structure parameters of sputtering target were designed.When the thickness of the cooling backplane was 13 mm,the inner diameter of the outer magnetic ring was 266 mm,the outer diameter was 310 mm,the thickness was 20 mm,the inner diameter of the inner magnetic ring was 270 mm,the outer diameter

关 键 词：磁控溅射靶 磁场仿真 有限元分析 优化 结构设计 圆筒式 

分 类 号：TG174.442[金属学及工艺—金属表面处理]