基于空间像主成分分析的光刻投影物镜波像差检测技术  

Wavefront Aberration Measurement Technique Based on Principal Component Analysis of Aerial Image for Lithographic Projection Lens

作　　者：雷威 李思坤[1,2,3] 潘东超 江一鹏 佟桐 王向朝 步扬[1] Lei Wei;Li Sikun;Pan Dongchao;Jiang Yipeng;Tong Tong;Wang Xiangzhao;Bu Yang(Laboratory of Information Optics and Optoelectronic Technology,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China;Center of Materials Science and Optoelectronics Engineering,University of Chinese Academy of Sciences,Beijing 100049,China;Department of Microelectronics,Shanghai University,Shanghai 200444,China;State Key Laboratory of Modern Optical Instrumentation,College of Optical Science and Engineering,Zhejiang University,Hangzhou 310027,Zhejiang,China)

机构地区：[1]中国科学院上海光学精密机械研究所信息光学与光电技术实验室,上海201800 [2]中国科学院大学材料与光电研究中心,北京100049 [3]上海大学微电子学院,上海200444 [4]浙江大学光电科学与工程学院现代光学仪器国家重点实验室,浙江杭州310027

出　　处：《光学学报》2023年第13期110-123,共14页Acta Optica Sinica

基　　金：国家自然科学基金区域创新发展联合基金重点项目(U22A2070)。

摘　　要：基于空间像主成分分析的波像差检测技术是一种原位光刻机投影物镜波像差检测技术。本文对该技术的检测模型和工程技术进行了系统研究。分析了照明条件、检测标记、空间像扫描范围等影响因素对检测精度的影响。研究了空间像传感器模型,并通过仿真和实验验证了传感器模型的有效性。研究了空间像定心误差对检测精度的影响,对比了不同定心方法下波像差检测模型的性能表现。分析了不同降噪方法的空间像降噪效果,并基于空间像噪声模型,提出了一种新的空间像降噪方法。仿真与实验结果表明,在各种影响因素中,照明部分相干因子和F方向采样范围对像差检测精度影响较大。定心方面,在X方向上六项模型定心精度更高,F方向上三项模型与六项模型各有优劣。平均值降噪法可以有效滤除空间像噪声,提高像差求解精度。像差漂移量仿真测试结果表明,该技术可用于校正光刻机的短期像差漂移。本文对该技术还给出了工程应用建议。Objective Lithography is a key technique in the manufacture of very large scale integrated circuits.The imaging quality of the lithographic projection lens directly affects the critical dimensions of integrated circuits.The wavefront aberration of the projection lens reduces lithographic imaging quality and affects the lithographic resolution.Therefore,measuring the wavefront aberration of the lithographic projection lens is crucial for improving lithographic imaging quality.The wavefront aberration measurement technique based on principal component analysis of aerial images for the lithographic projection lens is characterized by fast process and in-situ measurement.However,this technique is affected by the illumination condition,scanning range,sensor,and other factors in practical engineering applications.It also faces a number of problems,such as image shift and noise.This study investigates the above engineering issues,proposes engineering application suggestions,and verifies the effectiveness of the proposed method by simulation and experiments.Methods The commercial lithographic simulation software Santaurus lithography of Synopsys is employed for simulation research.The influences of different factors on the performance of wavefront aberration measurement are studied.An actual sensor structure is adopted to examine the influences of sensor parameters on the accuracy of wavefront aberration measurement,and the validity of the sensor model is verified by aerial image reconstruction experiments.The influence of the centering error on the accuracy of wavefront aberration measurement is analyzed.Two centering methods are compared to determine their respective applicability.The effectiveness of the centering method is verified by aerial image reconstruction experiments and two sensor experiments.The effects of different denoising methods on aerial images are studied,and an average denoising method tailored to the unique noise type of aerial images is proposed.Results and discussions The simulation and experiment

关 键 词：仪器 测量与计量 光刻 波像差检测 空间像 传感器模型 定心 降噪 

分 类 号：TN305.7[电子电信—物理电子学]