强光元件逆向哈特曼在位检测装置误差敏感因素分析与验证  

Error-sensitive factors analysis and verification for optical element in-situmeasurement device based on phase measuring deflectometry

作　　者：王姗姗 石峰[2] 乔硕 徐博文 郝群 宋辞 铁贵鹏 田野 翟德德 彭星 Wang Shanshan;Shi Feng;Qiao Shuo;Xu Bowen;Hao Qun;Song Ci;Tie Guipeng;Tian Ye;Zhai Dede;Peng Xing(Beijing Key Laboratory for Precision Optoelectronic Measurement Instrument and Technology,School of Optics and Photonics,Beijing Institute of Technology,Beijing 100081,China;College of Intelligence Science,National University of Defense Technology,Changsha 410073,China;School of Opto-Electronic Engineering,Changchun University of Science and Technology,Changchun 130022,China)

机构地区：[1]北京理工大学光电学院,精密光电测试仪器及技术北京市重点实验室,北京100081 [2]国防科技大学智能科学学院,长沙410073 [3]长春理工大学光电工程学院,长春130022

出　　处：《强激光与粒子束》2023年第9期31-40,共10页High Power Laser and Particle Beams

基　　金：国家重点研发计划项目(2021YFC2202403-2);国家自然科学基金项目(62175259)。

摘　　要：针对基于强光元件高精度面形在位检测需求,开展了面形测量误差敏感因素仿真分析,进行了系统结构误差和温度误差对测量结果的影响研究,分析各类误差对测量面形误差的具体影响,设计并搭建在位检测系统,开展系统温度变化、系统重复性、系统稳定性等测量实验。研究结果表明:所建立的逆向哈特曼仿真检测模型可用于平面、球面、非球面、自由曲面等各类型被测面,各类影响因素对测量结果的影响主要体现在低频误差上,对高频误差的影响相对较小,搭建的在位检测系统6 h内测量面形误差PV值最大不超过68 nm(约λ/10),RMS值最大不超过15 nm(约λ/40)。Based on optical element’s high precision in-situ measurement requirements,this paper carries outthe sensitive factor simulation analysis,studies the influence of systematic structural errors and temperature errors onthe measurement results,and designs and builds an in-situ measurement device to carry out measurement experimentsof system temperature change,system repeatability and system stability.The results show that the simulation detectionmodel can be used for plane/spherical/aspherical/free surface,the influence on the measurement results is mainlyreflected in the low frequency error,the high frequency error is relatively small,the maximum PV value of themeasurement surface shape error does not exceed 68nm(aboutλ/10),and the maximum RMS value does not exceed15 nm(aboutλ/40).

关 键 词：面形测量 在位检测 强光元件 误差分析 仿真模型 

分 类 号：TH74[机械工程—光学工程]