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作 者:詹汶峄 邹俭鹏[1] 冒旭 汤磊 韦鸿铭 Wen-yi ZHAN;Jian-peng ZOU;Xu MAO;Lei TANG;Hong-ming WEI(State Key Laboratory of Powder Metallurgy,Central South University,Changsha 410083,China)
机构地区:[1]中南大学粉末冶金国家重点实验室,长沙410083
出 处:《Transactions of Nonferrous Metals Society of China》2023年第8期2483-2496,共14页中国有色金属学报(英文版)
基 金:the financial support from the Natural Science Foundation of Hunan Province,China(No.2018JJ2524)。
摘 要:为了扩大固体润滑剂MoSe_(2)的应用领域,采用两步法制备MoSe_(2)薄膜。首先通过磁控溅射法在基底上沉积MoSe_(x)预制层,随后在Se蒸气中进行硒化处理得到MoSe_(2)薄膜。研究溅射和硒化过程对薄膜结构和摩擦学性能的影响。结果表明,两步法所制备的MoSe_(2)薄膜呈(002)晶面平行于基底的择优取向,结晶度得到提高。所制备的MoSe_(2)薄膜在空气环境下具有良好的耐磨性和润滑性能,其最低平均摩擦因数为0.0443,比磨损率为1.03×10^(−5) mm^(3)/(N·m)。此外,还探讨了MoSe_(2)薄膜的润滑机理,可通过黏附机制和填充修复机制起到减摩润滑的作用。In order to extend the application range of solid lubricant MoSe_(2),a two-step process was adopted to prepare the MoSe_(2) film.Namely,the MoSe_(x) precursor layer was firstly deposited on the substrate by magnetron sputtering method,and then selenized in a Se vapor atmosphere to obtain MoSe_(2) film.The effects of the sputtering and selenization process on the structure and tribological properties of the films were investigated.The results show that the two-step prepared MoSe_(2) films exhibit a preferential orientation with(002)basal plane parallel to the substrate and an improved crystallinity.The prepared MoSe_(2) film has good wear resistance and lubricating performance in an ambient air environment,with the lowest average friction coefficient of 0.0443 and a specific wear rate of 1.03×10^(−5) mm^(3)/(N·m).In addition,the lubrication effects of MoSe_(2) films through the adhesion mechanism and fill in-repair mechanism were further discussed.
关 键 词:MoSe_(2)薄膜 磁控溅射 硒化 摩擦学性能 润滑机制 三维形貌
分 类 号:TB383.2[一般工业技术—材料科学与工程]
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