Nanoscale multi-beam lithography of photonic crystals with ultrafast laser  

作　　者：Jiaqun Li Jianfeng Yan Lan Jiang Jiachen Yu Heng Guo Liangti Qu 

机构地区：[1]State Key Laboratory of Tribology in Advanced Equipment,Department of Mechanical Engineering,Tsinghua University,Beijing 100084,China [2]School of Mechanical Engineering,Beijing Institute of Technology,Beijing 100081,China [3]Department of Chemistry,Tsinghua University,Beijing 100084,China

出　　处：《Light(Science & Applications)》2023年第8期1604-1615,共12页光（科学与应用)（英文版）

基　　金：This work is supported by the National Natural Science Foundation of China(Grant no.52075289).

摘　　要：Photonic crystals are utilized in many noteworthy applications like optical communications,light flow control,and quantum optics.Photonic crystal with nanoscale structure is important for the manipulation of light propagation in visible and near-infrared range.Herein,we propose a novel multi beam lithography method to fabricate photonic crystal with nanoscale structure without cracking.Using multi-beam ultrafast laser processing and etching,parallel channels with subwavelength gap are obtained in yttrium aluminum garnet crystal.Combining optical simulation based on Debye diffraction,we experimentally show the gap width of parallel channels can be controlled at nanoscale by changing phase holograms.With the superimposed phase hologram designing,functional structures of complicated channel arrays distribution can be created in crystal.Optical gratings of different periods are fabricated,which can diffract incident light in particular ways.This approach can efficiently manufacture nanostructures with controllable gap,and offer an alternative to the fabrication of complex photonic crystal for integrated photonics applications.

关 键 词：LITHOGRAPHY BEAM OPTICS 

分 类 号：O43[机械工程—光学工程]