基于改进Gerchberg-Saxton算法的全息双面光刻方法  

Holographic Double-Sided Photolithography Based on Improved Gerchberg-Saxton Algorithm

作　　者：王化宾 何渝[1,2] 赵立新 Wang Huabin;He Yu;Zhao Lixin(State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering,Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209,Sichuan,China;University of Chinese Academy of Sciences,Beijing 100049,China)

机构地区：[1]中国科学院光电技术研究所微细加工光学技术国家重点实验室,四川成都610209 [2]中国科学院大学,北京100049

出　　处：《激光与光电子学进展》2023年第16期61-67,共7页Laser & Optoelectronics Progress

摘　　要：针对目前双面微器件加工方法步骤繁琐、效率低的问题,提出基于改进Gerchberg-Saxton(GS)算法的全息双面光刻方法,使用单个光源在玻璃基底的上下表面同时曝光,进行双面图形的制作。该方法通过计算不同轴向位置图案对应的组合全息图,并将其加载到空间光调制器(LCOS-SLM)上,对入射光场进行调制,从而在目标空间内实现双面图形重现。采用改进GS算法对距离焦面2 mm处的图案A与距离焦面4.06 mm处的图案B进行全息图计算与仿真重建。搭建实验装置,对3 mm厚透明石英玻璃基底的上下表面同时曝光,且对光场生成过程中的散斑、杂散光及串扰问题做出分析并提出解决方案,最终实现60μm线宽双层图案曝光,验证了所提方法进行双面光刻的可行性。所提方法使用单张全息图和单个光源,通过单次曝光即可在目标体积内生成多层任意图形,极大地简化了双面图形制作的步骤。Given the problems of cumbersome steps and low effectiveness of the present double-sided microdevice processing technique,a holographic double-sided photolithography based on the enhanced Gerchberg-Saxton(GS)algorithm is proposed,which employs a single light source to achieve a double-sided pattern produced by single exposure on the upper and lower surfaces of the glass substrate.This approach realizes double-sided pattern reproduction in the target space by determining the combined holograms corresponding to various axial position patterns and loading them onto a spatial light modulator(LCOS-SLM)to regulate the incident light field.The holographic reconstruction of patterns A and B at distances of 2 mm and 4.06 mm from the focal plane,respectively,is calculated and simulated using the modified GS method.The experimental device was set up to achieve the simultaneous exposure of the upper and lower surfaces of the 3-mm thick transparent quartz glass substrate,and the problems of speckle,stray light,and crosstalk in the process of light field generation were examined and solutions were proposed,and finally 60-μm linewidth double-layer pattern exposure was realized,which confirm the feasibility of the proposed method for double-sided lithography.A single hologram and a single light source are used in the technique described in this research to create numerous layers of arbitrary images in the target volume during a single exposure,considerably simplifying the processes involved in producing double-sided pictures.

关 键 词：计算全息 微纳制造 双面光刻 光场调控 全息算法 

分 类 号：O438.1[机械工程—光学工程]