基于双光子直写的微纳光学器件研究进展  

Advancements in Micro-Nano Optical Device Based on Two-Photon Direct Writing

作　　者：何敏菲 朱大钊 王洪庆 杨振宇[1] 沈凡琪 吴仍茂[1] 匡翠方[1,2] 刘旭 He Minfei;Zhu Dazhao;Wang Hongqing;Yang Zhenyu;Shen Fanqi;Wu Rengmao;Kuang Cuifang;Liu Xu(State Key Laboratory of Extreme Photonics and Instrumentation,Zhejiang University,Hangzhou 310027,Zhejiang,China;Zhejiang Laboratory,Hangzhou 311121,Zhejiang,China)

机构地区：[1]浙江大学极端光学技术与仪器全国重点实验室,浙江杭州310027 [2]之江实验室,浙江杭州311121

出　　处：《光学学报》2023年第16期193-208,共16页Acta Optica Sinica

基　　金：高集成三维光子器件的超分辨并行激光加工(2021YFF0502700);浙江省自然科学基金重大项目(LD21F050002);之江实验室重大科研项目(2020MC0AE01)。

摘　　要：双光子直写技术凭借其高精度、任意三维结构刻写、高成本效益、材料设计高自由度等特点,已被成功应用到多种微纳光学器件的刻写中。基于双光子直写的微纳光学器件应用不断拓展,对刻写分辨率和通量都提出了更高的需求。超分辨激光纳米直写和高通量激光直写技术使得双光子直写具有nm级精度与cm级尺寸的跨尺度加工能力,进一步拓展了基于双光子直写的微纳光学器件研究领域。本文首先对双光子直写原理进行概述,介绍本课题组在利用双光子直写技术制造衍射光学器件、光纤集成器件方面的研究进展;然后,介绍本课题组在使用超分辨激光直写技术制备纳米光子器件方面的拓展研究,并展示了高精度、高通量激光直写技术在大面积刻写微纳光学器件上的技术优势。Significance Micro-nano optical devices,resulting from the integration of photonics and micro-nano technology,are rapidly growing within the optoelectronics industry.These devices can effectively modulate light fields according to their design and have been widely used in fields such as photonic integrated chips,optical communications,optical storage,sensing imaging,display,solid-state lighting,biomedicine,and photovoltaic energy.As the applications for micro-nano optical devices continue to expand,there is an increasing demand for the development of micro-nano manufacturing technologies to support their production.A range of micro-nano manufacturing techniques is required to meet the writing requirements of different micro-nano optical devices.These techniques include direct laser writing(DLW),interference lithography,mask projection lithography,nanoimprint lithography,electron beam lithography,and ion beam lithography.Interference lithography can achieve rapid large-area writing through interference exposure but is limited in its ability to customize writing patterns,and it is difficult for writing aperiodic structures.Both mask projection lithography and nanoimprinting are well-suited for the fast fabrication of high-resolution features but require the prior fabrication of templates and offer limited flexibility in structure writing.Writing with focused charged particles(ions and electrons)can achieve resolution below 10 nm,but both electron beam lithography and ion beam lithography require a vacuum environment.They have high system costs and are not well-suited for writing three-dimensional structures.DLW technology based on two-photon polymerization(also known as two-photon direct writing)has emerged as an important technology for manufacturing micro-nano optical devices due to its submicron resolution,ability to write arbitrary three-dimensional structures,and cost-effectiveness.Two-photon polymerization exhibits nonlinear characteristics that can confine photochemical conversion to the central region where

关 键 词：激光直写 双光子直写 微纳光学器件 纳米光刻 高通量刻写 

分 类 号：O436[机械工程—光学工程] TH74[理学—光学]