表面增强红外光谱在研究电子电镀添加剂界面吸附的机遇  

Research opportunities of surface enhanced infrared absorption spectroscopy on adsorption behavior of additives for electroplating

作　　者：毛子杰 吴依彩 蒋昆 蔡文斌[1] Zijie Mao;Yicai Wu;Kun Jiang;Wen-Bin Cai(Shanghai Key Laboratory of Molecular Catalysis and Innovative Materials,Department of Chemistry,Fudan University,Shanghai 200438,China;School of Mechanical Engineering,Shanghai Jiao Tong University,Shanghai 200240,China)

机构地区：[1]复旦大学化学系,上海市分子催化与功能材料重点实验室,上海200438 [2]上海交通大学机械与动力工程学院,上海200240

出　　处：《中国科学：化学》2023年第10期1812-1821,共10页SCIENTIA SINICA Chimica

基　　金：国家自然科学基金(编号:22241201,22272033)资助项目。

摘　　要：电子电镀是芯片金属互连的关键技术,对相关添加剂分子的界面吸附结构和行为进行可靠表征,是理解填充过程机制、设计新型添加剂的先决条件.衰减全反射–表面增强红外光谱(ATR–SEIRAS)具有强大的分子结构识别能力和对各类金属电极应用的普适性,为研究电子电镀金属–溶液界面的添加剂吸附结构及竞合作用提供了新机遇.基于本课题组的相关工作基础,本文针对电子电镀添加剂基础研究的需求,概述了表面增强红外光谱的基本原理,介绍了该方法在宽频与流动检测方面的新进展以及相关应用研究案例,归纳了该方法目前的不足并展望了未来的研究方向.Electroplating plays an important role in chip manufacturing,and reliable characterization of the interface structure of additives at the molecular level is a prerequisite for the understanding of superfilling mechanism.Attenuated total reflection surface enhanced infrared absorption spectroscopy(ATR–SEIRAS)has a strong ability to identify the structure for adsorbed species at the electrode surface,which provides an opportunity to study the interface mechanism and competitive behavior of additives.Herein,the principle and characteristics of ATR–SEIRAS are introduced,and the recent methodological development and research progress are reviewed in view of the demand orientation in the field of electroplating,and the existing shortcomings and future research directions are prospected.

关 键 词：表面增强红外光谱 电子电镀 添加剂 超级填充 

分 类 号：O657.33[理学—分析化学] TQ153[理学—化学] TN405[化学工程—电化学工业]